2007
DOI: 10.1016/j.ssc.2007.04.023
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Epitaxial graphene

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Cited by 841 publications
(622 citation statements)
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“…[9], where, by deploying a continuum approximation, the small angle limit was investigated and v F found to be suppressed. Experimentally, the evidence for this seems uncertain as a suppression of v F is found for graphene stacks grown on both the C and Si faces of SiC, whereas twist boundary faults appear only during growth on the C face [17]. This disagreement between the continuum approximation for the (singular) !…”
Section: 056803 (2008) P H Y S I C a L R E V I E W L E T T E R Smentioning
confidence: 98%
“…[9], where, by deploying a continuum approximation, the small angle limit was investigated and v F found to be suppressed. Experimentally, the evidence for this seems uncertain as a suppression of v F is found for graphene stacks grown on both the C and Si faces of SiC, whereas twist boundary faults appear only during growth on the C face [17]. This disagreement between the continuum approximation for the (singular) !…”
Section: 056803 (2008) P H Y S I C a L R E V I E W L E T T E R Smentioning
confidence: 98%
“…We observe cooling of the photogenerated carrier distribution as well as electronhole recombination in graphene in real time. Our results indicate that the recombination times in graphene depend on the carrier density and material disorder.The epitaxial graphene samples used in this work were grown on the carbon face of semi-insulating 6H-SiC wafers using techniques that have been reported previously [12]. As discussed in [8,11], X-ray photoemission, Raman, and optical/IR/THz transmission spectroscopy were used to characterize each sample to determine the number of carbon atom layers and the carrier momentum relaxation time.…”
mentioning
confidence: 99%
“…Advances in the epitaxial growth of graphene films on SiC have the potential to open new classes of device applications that may revolutionize the semiconductor road map for future decades [1][2][3][4][5][6][7][8][9]. However, this progress will require an in-depth understanding and utilization of the electronic processes that take place at the nanoscale, in particular, the role of the interface buffer layer, where most of the electronic properties of the system can be controlled [10].…”
mentioning
confidence: 99%