2008
DOI: 10.1038/nmat2166
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Epitaxial graphene on ruthenium

Abstract: Graphene has been used to explore the fascinating electronic properties of ideal two-dimensional carbon, and shows great promise for quantum device architectures. The primary method for isolating graphene, micromechanical cleavage of graphite, is difficult to scale up for applications. Epitaxial growth is an attractive alternative, but achieving large graphene domains with uniform thickness remains a challenge, and substrate bonding may strongly affect the electronic properties of epitaxial graphene layers. He… Show more

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Cited by 2,229 publications
(1,749 citation statements)
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“…However, a large number of defects, including point defects, line defects and adsorption of functional groups, which are formed during the oxidation, vigorous exfoliation and reduction processes are introduced into these assembled graphene films. Epitaxial growth on silicon carbide [306308] or ruthenium [309] at high-temperatures in ultrahigh vacuum can provide high-quality graphene with a size as large as that of the substrate [310]. However, the produced graphene strongly interacts with the substrate, hindering fabrication of electrically isolated monolayer graphene.…”
Section: Disorders In Graphene Structurementioning
confidence: 99%
“…However, a large number of defects, including point defects, line defects and adsorption of functional groups, which are formed during the oxidation, vigorous exfoliation and reduction processes are introduced into these assembled graphene films. Epitaxial growth on silicon carbide [306308] or ruthenium [309] at high-temperatures in ultrahigh vacuum can provide high-quality graphene with a size as large as that of the substrate [310]. However, the produced graphene strongly interacts with the substrate, hindering fabrication of electrically isolated monolayer graphene.…”
Section: Disorders In Graphene Structurementioning
confidence: 99%
“…There are many methods to obtain single layer graphene at laboratory, such as mechanical exfoliation via Scotch tape [4], epitaxial growth by thermal desorption of Si atoms from the SiC surface [32], epitaxial growth by chemical vapor deposition (CVD) on transition metals [33,34], chemical reduction of liquid suspension graphene oxide [35], liquid-phase exfoliation [36], chemical exfoliation [37], unzipping CNTs [38], etc. Among all these methods, mechanical exfoliation and CVD growth on SiC or metals are most frequently utilized in experiments.…”
Section: Methods To Obtain Graphenementioning
confidence: 99%
“…图 4 Ru(0001)表面上的石墨烯偏析生长 [57] Figure 4 Segregation growth of graphene on Ru(0001) (a) UHV-SEM image of monolayer graphene on Ru(0001), inset: carbon KLL scanning Auger microscopy image; (b) UHV-SEM of second-layer islands; diffraction pattern of (c) monolayer and (d) two-layer graphene on Ru(0001); (e) in situ microscopy of graphene growth and the schematic of growth mechanism. Reprinted with permission [57] [66,67,29] .…”
Section: 在真空环境下 通过对各种掺碳单晶金属进行退 火 我们便能在各种单晶金属表面偏析生长石墨烯 如mentioning
confidence: 99%
“…Reprinted with permission [57] [66,67,29] . 基于这一考量, 我们 [29] 开展了低真空条件下 的多晶金属表面的碳偏析研究, 成功地建立了普适性的 廉价生长大面积高质量石墨烯的偏析方法.…”
Section: 在真空环境下 通过对各种掺碳单晶金属进行退 火 我们便能在各种单晶金属表面偏析生长石墨烯 如unclassified