2009
DOI: 10.1016/j.jlumin.2009.03.039
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Epitaxial growth and optical characterization of compound semiconductor β-FeSi2 prepared by pulsed laser deposition

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Cited by 6 publications
(2 citation statements)
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“…[2][3][4] Many techniques have been adopted to produce nanosized β-FeSi 2 materials, for instance, ion beam synthesis, reactive epitaxy, magnetron sputtering, pulsed-laser deposition, and molecular beam epitaxy, and their PL properties have also been explored. [5][6][7][8][9] It has been pointed out that the origin of the PL from β-FeSi 2 is quite complicated because of the controversial band gap structure. Most experiments have suggested that β-FeSi 2 has a direct band gap, [1,[4][5][6] but some reports have indicated otherwise.…”
Section: Introductionmentioning
confidence: 99%
“…[2][3][4] Many techniques have been adopted to produce nanosized β-FeSi 2 materials, for instance, ion beam synthesis, reactive epitaxy, magnetron sputtering, pulsed-laser deposition, and molecular beam epitaxy, and their PL properties have also been explored. [5][6][7][8][9] It has been pointed out that the origin of the PL from β-FeSi 2 is quite complicated because of the controversial band gap structure. Most experiments have suggested that β-FeSi 2 has a direct band gap, [1,[4][5][6] but some reports have indicated otherwise.…”
Section: Introductionmentioning
confidence: 99%
“…Semiconducting iron di-silicide β-FeSi 2 is one of the most promising materials for the Si-based thin films and optoelectronic devices and photonics. It has optical band gap at 0.80 to 0.89 eV region and ecologically friendly constituents such as non-toxic and abundant on earth [1,2]. Therefore β-FeSi 2 has great potentiality as a silicon-based light emitting material, photovoltaic and solar cell and photnics.…”
Section: Introductionmentioning
confidence: 99%