requires the photodetection wavelength of the photo detector could match the source wavelength. [4][5][6] In this regard, the bandgap tunable semiconductor and its fabricated photodetector with fast response speed have become a research hotspot. [7][8][9] InGaN semiconductors can achieve wavelength-selective absorption owning to their tunable bandgap (0.65-3.4 eV), which is adjusted by varying the composition of Indium (In). [10][11][12] Thanks to the development of semiconductor industry technology, the InGaN photodetector with PIN and integrated structure has been used in visible light communication systems. [13][14][15] However, the above InGaN-based ultrafast photodetector heavily relies on expensive, slow, complex material growth and chip preparation processes. [16] Accordingly, the development of a simple-structured photodetector with a fast response speed is urgently needed. [17] The photodetector with simple heterojunction demonstrates fast photodetection owing to the built-in electric field to facilitate carrier separation and transport. [18,19] Among the III-nitrides materials, on account of the high electron mobility (4400 cm 2 V −1 s −1 ), the InN semiconductors are widely used to fabricate fast photodetectors. [20,21] Regarding the mentioned above, the InN/InGaN heterojunction is considered a promising candidate for preparing a fast photodetector. This is well known that the high-performance photodetector composed of wide band gap materials lies on top of the narrow band gap materials, thus the InGaN should be grown on the top of InN. [22] However, this InN/InGaN heterojunction cannot be realized due to the growth temperature of InGaN is higher than the dissociation temperature of InN.The dilemma above might be solved by introducing 1D InN nanorod array (NRA) to InGaN films, which could not only relax the strain to form defect-free lattice-mismatched heterostructures but also break through the material arrangement limit of the bandgap. [23,24] Previous research has reported an InN/InGaN heterojunction with the structure of InN NRA on the InGaN epilayer and applied it to optoelectronic devices. [25,26] Nevertheless, this method needs phase-separated from In-rich InGaN buffer as the nucleation sites, which will cause the diameter uniformity of these structures to be poor. The axial heterojunction structure is an effective strategy, on one hand, the diameter uniformity of InN could be controlled, on the other hand, the 1D geometry could confine carriers separation in a very small NRA Due to wavelength-selective characteristics, the InGaN-based photodetectors show bright prospects in visible light communication and fast imaging system. However, the application of InGaN photodetectors with simple structures is limited in the above field owing to the slow response speed. Herein, an ultrafast photodetector based on axial InN/InGaN nanorod array (NRA) heterojunction is prepared through a self-catalytic high (930 °C) and low (400 °C) temperature two-step growth method by molecular beam epitaxy (MBE). The perf...