2012
DOI: 10.1016/j.matchemphys.2012.03.027
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Epitaxial growth of Bi ultra-thin films on GaAs by electrodeposition

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Cited by 8 publications
(6 citation statements)
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“…Using the values of the bulk material, the vertical directions in Figure a and Figure b have a mismatch of 3%, whereas the horizontal directions present a mismatch of 13%. This result is in agreement with other studies. ,, …”
Section: Resultssupporting
confidence: 94%
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“…Using the values of the bulk material, the vertical directions in Figure a and Figure b have a mismatch of 3%, whereas the horizontal directions present a mismatch of 13%. This result is in agreement with other studies. ,, …”
Section: Resultssupporting
confidence: 94%
“…Other authors have obtained electrodeposited Bi films with the same texture on these GaAs orientations. 19,30,31 In the case of Bi films grown on GaAs(110) substrates, there is also a small contribution of Bi(012) planes when Proc. 1 is followed, which indicates a higher crystal disorder.…”
Section: ■ Results and Discussionmentioning
confidence: 99%
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“…The growth modes of high-quality thin films are usually divided into epitaxial growth and preferred orientation of growth. The key factor of epitaxial growth is the lattice matching relationship between the films and the substrates (Kokubo et al, 2015;Cho et al, 1998;Plaza et al, 2012). In contrast, the preferred orientation growth is mainly affected by the surface energy rather than the lattice matching.…”
Section: Introductionmentioning
confidence: 99%