2014
DOI: 10.1088/1367-2630/16/9/095004
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Epitaxial growth of silicene on ultra-thin Ag(111) films

Abstract: Epitaxial growth of silicene on atomically flat ultra-thin Ag(111) films was investigated using scanning tunneling microscopy. The Ag films were prepared by low-temperature deposition of Ag on Si substrates, followed by soft annealing at room temperature. Patchy 4 × 4, √13 × √13, √7 × √7, and 2√3 × 2√3 silicene domains were nucleated on regions that were one monolayer lower than the pristine Ag surface after the initial morphological change had been completed. On the first-layer silicene containing the above d… Show more

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Cited by 112 publications
(95 citation statements)
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“…However, more recent studies found that the surface reconstruction occurs on multilayered Si instead of a monolayer151617182930. In addition, such a phase resembles both geometrically and electronically the reconstructed Ag on Si(111), suggesting the formation of a surface alloy313233.…”
mentioning
confidence: 99%
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“…However, more recent studies found that the surface reconstruction occurs on multilayered Si instead of a monolayer151617182930. In addition, such a phase resembles both geometrically and electronically the reconstructed Ag on Si(111), suggesting the formation of a surface alloy313233.…”
mentioning
confidence: 99%
“…Thus far, freestanding silicene has not been synthesized. Most of the silicene structures were grown on Ag surfaces89101112131415161718, with a few successes on ZrB 2 19 and Ir20. Yet, interaction with the substrate may render it rather difficult to probe the intrinsic properties of silicene21222324.…”
mentioning
confidence: 99%
“…However, a recent experimental study suggested that the Ag(111) surface is not ideally stable and does not remain intact during silicene growth. 8 The Ag atoms readily exchange with Si atoms at the Ag(111) surfaces, making the growth process complicated and difficult to control.…”
mentioning
confidence: 99%
“…One was equipped with a scanning tunneling microscope (STM) unit, 8 while the other was equipped with low energy electron diffraction (LEED) optics and a hemispherical electron energy analyzer for X-ray photoelectron spectroscopy (XPS) and angle-resolved photoelectron spectroscopy (ARPES). 19 Si(111) substrates were cleaned by flashing at 1470 K for 15 s and subsequent slow cooling to room temperature (RT).…”
mentioning
confidence: 99%
“…In addition, according to highly reactive surface, not only ultra-high vacuum system but also substrate for stabilizing sp 2 silicene should be necessary. In recent, there are many researches about fabrication of silicene on metal substrate, mainly Ag (Aufray et al, 2010;Gao & Zhao, 2012;Borensztein et al, 2014;Cahangirov et al, 2014;Chen & Weinert, 2014;Guo & Oshiyama, 2014;Johnson et al, 2014;Kawahara et al, 2014;Liu et al, 2014aLiu et al, , 2014bMahatha et al, 2014;Moras et al, 2014;Pflugradt et al, 2014a;Scalise et al, 2014;Shirai et al, 2014;Sone et al, 2014;Tchalala et al, 2014;Yuan et al, 2014). However the interaction between silicene and metal substrate degrades intrinsic properties of silicene.…”
Section: Introductionmentioning
confidence: 99%