2020
DOI: 10.1016/j.tsf.2020.137815
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Epitaxial optimization of atomically smooth Sr3Al2O6 for freestanding perovskite films by molecular beam epitaxy

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Cited by 25 publications
(40 citation statements)
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“…Reported texture analysis for physical deposited SAO films, molecular beam epitaxy (MBE), show rocking curve FWHM values slightly smaller, that is, FWHM = 0.015° (FWHM= 0.013° for STO). [20] Cross-sectional Z-contrast high angle annular dark field (HAADF) using scanning transmission electron microscopy (STEM), Figure 3d,e, further confirms the epitaxial growth of SAO film on the STO (001) substrate. The HAADF-STEM images show high crystal quality and sharp interface.…”
Section: (3 Of 7)mentioning
confidence: 60%
See 1 more Smart Citation
“…Reported texture analysis for physical deposited SAO films, molecular beam epitaxy (MBE), show rocking curve FWHM values slightly smaller, that is, FWHM = 0.015° (FWHM= 0.013° for STO). [20] Cross-sectional Z-contrast high angle annular dark field (HAADF) using scanning transmission electron microscopy (STEM), Figure 3d,e, further confirms the epitaxial growth of SAO film on the STO (001) substrate. The HAADF-STEM images show high crystal quality and sharp interface.…”
Section: (3 Of 7)mentioning
confidence: 60%
“…Note that MBE and pulsed laser deposition films of thickness ranging from 8 unit cells to 20 nm show a step-and-terrace surface morphology (with rms <0.7 nm), replicating the STO surface. [15,16,20] Importantly, SAO exposure to ambient moisture can severely degrade the surface morphology.…”
Section: (3 Of 7)mentioning
confidence: 99%
“…Therefore, the growth condition of the SAO sacrificial buffer layers should be optimized to show clear fourfold reconstructed electron diffraction pattern that illustrates four intensity oscillation periods in the growth of one u.c. SAO as seen in Figure 1b (left) and descripted elsewhere . After the growth of PTO layer, reflection high‐energy electron diffraction (RHEED) patterns still remain visible (Figure 1b, right), which indicates high quality of the films.…”
mentioning
confidence: 86%
“…As mentioned above, the precise deposition time of each source is not available using the shuttered mode. In the codeposition, although the oscillations are observed, the overall intensity shows little dependence on the variation of the Nd:Ni flux ratio, which is commonly employed in the growth of other systems [40,41]. Hence, another specific way is demanded to conduct the calibration.…”
Section: Effect Of Cation Stoichiometry On Ndnio 3 Filmsmentioning
confidence: 99%