1997
DOI: 10.1109/68.553101
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Epitaxial SiGeC waveguide photodetector grown on Si substrate with response in the 1.3-1.55-μm wavelength range

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Cited by 29 publications
(8 citation statements)
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“…At the same time the concept of silicon microphotonics or optoelectronics emerged impetuously [7][8][9]. At the end of the last century, the heterogrowth of germanium on silicon was mastered, which allows the development of high-speed CMOS compatible optical receivers [10,11]. At the same time, silicon-based waveguides shrank in size: from more than 100 μm 2 (typical of waveguides based on refractive-index contrast given by different doping) during the 1980s to the 5 μm 2 size of rib waveguides where Si/SiO 2 was used.…”
Section: Introduction: Silicon Photonicsmentioning
confidence: 99%
“…At the same time the concept of silicon microphotonics or optoelectronics emerged impetuously [7][8][9]. At the end of the last century, the heterogrowth of germanium on silicon was mastered, which allows the development of high-speed CMOS compatible optical receivers [10,11]. At the same time, silicon-based waveguides shrank in size: from more than 100 μm 2 (typical of waveguides based on refractive-index contrast given by different doping) during the 1980s to the 5 μm 2 size of rib waveguides where Si/SiO 2 was used.…”
Section: Introduction: Silicon Photonicsmentioning
confidence: 99%
“…Orner et al [3] have successfully grown fully relaxed layers of Ge rich alloys on Si substrate. Due to its lower band gap such layers can be used as photodetectors at 1.55 µm [4].…”
Section: Introductionmentioning
confidence: 99%
“…20 Time-integrated (fast, circle; slow, square) spectra for the sample A. The Er 3þ spectral features are clearly visible for the slow process.…”
mentioning
confidence: 99%