2016
DOI: 10.1039/c6ce01375a
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Epitaxial silicides: the case of Fe, Ni, and Ti

Abstract: Ultra-thin epitaxial silicides were formed and their structures were examined by electron microscopy and X-ray diffraction. The epitaxial relationship between the silicides and Si was discovered and examined by electron diffraction patterns. The thickness of the silicide can be controlled by a double-sputtering process, rather than by the amount of deposited metals. Intermediate and low temperature phase silicides (C40-TiSi 2 and Fe 2 Si) were observed, suggesting that process control is also an important fact… Show more

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