“…Generally, M-Mica has higher transparency, slightly better electrical properties and better flexibility than F-Mica, while F-Mica has better thermal stability than M-Mica, thus F-Mica is more suitable for the films which need higher annealing temperature for better crystallinity, and M-Mica is more suitable to increase the flexibility of films or devices. However, even though the advantages of micas enable the epitaxial layer to grow with its bulk lattice, it can hardly control the orientation of epitaxy layer, thus a thin buffer layer on the surface of mica or surface treatment for mica is usually needed [10,28,56,59,63,66,68,70,74] .…”