Epitaxy and bonding of peelable ZnO film on graphene/ZnO substrate

Wang, Peng; Pan, Xinhua; Wang, Ning; Zheng, Sinan; Zhang, Tao; Liu, Yunze; Wang, Yao; Wang, Fengzhi; Zhu, Guangmin; Wang, Jiangbo; Ye, Zhizhen

doi:10.1016/j.jallcom.2022.167129

Cited by 5 publications

(1 citation statement)

References 45 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…To avoid the influence of substrate alignment on thin film epitaxy [ 23 ], high-penetration amorphous alkali-free glass was selected as the substrate in this experiment, and a hydrogen–nitrogen mixture gas was used for the two-step annealing, resulting in Cu 2+ being reduced to Cu + by H 2 so that CuCrO 2 can be formed at a lower-temperature transmittance of the film [ 24 ], and the aging time was controlled by a chelating agent to obtain the desired film grain and surface morphology.…”

Section: Introductionmentioning

confidence: 99%

Improving the p-Type CuCrO2 Thin Film’s Electrical and Optical Properties

et al. 2023

View full text Add to dashboard Cite

In this research, we studied the functional properties of CuCrO2, which is the most promising p-type transparent conductive oxide (TCO). The thin films were fabricated using a spin coating technique. The diffraction patterns were obtained with the help of X-ray diffractions, and the optical properties of absorption characteristics were studied using UV-visible absorption. The physical properties of film formation and surface morphology were analyzed using FESEM analysis. The aging properties were also analyzed with the help of various precursors with different aging times. The CuCrO2 thin films’ functional properties were determined by using chelating agent and precursor solution aging times. The CuCrO2 thin films have better transmittance, resistance, figure of merit (FOM), and electrical conductivity. Moreover, the resistivity values of the CuCrO2 thin films are 7.01, 9.90, 12.54, 4.10, 2.42, and 0.35 Ω cm. The current research article covers the preparation of copper chromium delafossite thin films. These thin films can be suitable for hole transport layers in transparent optoelectronic devices.

show abstract

Section: Introductionmentioning

confidence: 99%