Point defects in semiconductor materials are known to have important influence on the performance of electronic devices. For defect control, knowledge on the model of defects and their properties is required. Information on defects, such as the symmetry and the localization of spins, is essential for identification of defects and understanding their electronic structure. Such information can be obtained from Electron Paramagnetic Resonance (EPR). In many cases, the energy levels of defects can be determined from photoexcitation EPR (photo-EPR) or temperature dependence of the EPR signal. The thesis contains six papers, focusing on the identification and electronic structure investigation of defects and impurities in Al x Ga 1-x N (x~0.7-1) and silicon carbide (SiC) using EPR in combination with other electrical characterizations and density functional theory calculations.The two first papers concern EPR studies of silicon (Si) in AlGaN alloys. Due to its direct and wide band gap which can be tailored from 3.4 eV for GaN to 6.2 eV for AlN, high-Al-content wurtzite Al x Ga 1-x N (x≥0.7) has been considered as a promising material for fabrication of compact, highefficiency and non-toxic deep ultraviolet light-emitting diodes (LEDs) and laser diodes (LDs) for replacing low-efficiency and toxic mercury lamps in water/air purification and sterilization. Si is commonly used for n-type doping in AlGaN and AlN, but the conductivity of Si-doped Al x Ga 1-x N was often reported to drop abruptly at high Al content (x>0.7) and the reason was often speculated to be due to either carrier compensation by other deep levels or Si itself when it transforms from a shallow donor to a DX (or negative-U) center which acts as an acceptor. In paper 1, we showed that Si already forms a stable DX center in Al x Ga 1-x N with x ~0.77. However, with the Fermi level locating only ~3 meV below the neutral charge state, E d , Si still behaves as a shallow donor. Negligible carrier compensation by oxygen (O) in Al 0.77 Ga 0.23 N:Si layers was observed, suggesting that at such Al content, O does not seem to hinder the n-type doping in the material. In paper 2, we found the coexistence of two Si DX centers, the stable DX1 and the metastable DX2, in Al x Ga 1-x N for x≥0.84. For the stable DX1 center, abrupt deepening of the energy level of the negative charge state DX -, E DX , which determines the ionization energy E a of the Si donor, with increasing of the Al content for x≥0.83 was observed. The dependence of E a on the Al content in Al x Ga 1-x N:Si layers (0.79≤x≤1) was determined. The results explain the drastic decrease of the conductivity as often reported for Al x Ga 1-x N:Si in previous transport studies. For the metastable DX2 center, we found that the E DX level remains close to E d for x=0.84÷1.SiC is a wide band-gap semiconductor having high-thermal conductivity, high breakdown field, and large saturated electron drift velocity which are iv essential properties for high-voltage and high-power devices. In paper 3, the identif...