2000
DOI: 10.1016/s0040-6090(00)00662-3
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Equilibrium shape of steps and islands on polar CdTe(001) surface: application to the preparation of self organized templates for growth of nanostructures

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Cited by 8 publications
(5 citation statements)
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“…Metal-rich MBE growth of (001) CdTe was found to produce [100] step edges. 27,28 The x-ray measurements of the CdZnTe substrate indicate an average 0.3°misorientation from the (111). The HgCdTe epilayer is azimuthally tilted by 0.1°with respect to the CdZnTe substrate (Fig.…”
Section: As-grown Lwir Lpe (111)a Hgcdtementioning
confidence: 99%
“…Metal-rich MBE growth of (001) CdTe was found to produce [100] step edges. 27,28 The x-ray measurements of the CdZnTe substrate indicate an average 0.3°misorientation from the (111). The HgCdTe epilayer is azimuthally tilted by 0.1°with respect to the CdZnTe substrate (Fig.…”
Section: As-grown Lwir Lpe (111)a Hgcdtementioning
confidence: 99%
“…3). These features which contrast with what is observed for (001) Si and GaAs surfaces, can be explained by the strong ionicity of the atomic bonding in these materials which induces a large electrostatic interaction between charged atoms on the step edges [18]. As a consequence these experimental results have been used to find out and to prepare the vicinal surfaces suitable for growing self-organized quantum structures.…”
Section: Artificial Organization Of Cdte Nanostructuresmentioning
confidence: 85%
“…The checkerboard structure which appears on a A-type vicinal surface is an appropriate template to grow quantum dots and to force them to have an in-plane ordering [18,20]. Such results are presented in Fig.…”
Section: Artificial Organization Of Cdte Nanostructuresmentioning
confidence: 95%
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“…19,20 Nano-scale surface clustering as well as step flow growth for (001) CdTe has also been previously observed. 6,21,22 The surface has an RMS roughness of %5.0 nm, 2 to 3 times rougher than HgCdTe/CdZnTe surface. No cross-hatch pattern for CdTe/ZnTe/Si has been observed.…”
Section: Cross-hatch Patternmentioning
confidence: 99%