Er-doped oxyfluoride silicate thin films prepared by pulsed laser deposition

Er3+-doped fluorotellurite thin film glasses with improved photoluminescence emission at 1.53 µm

“…Moreover, the observation of well-defined interference fringes in the experimental transmission spectrum (Fig. 1) evidences the deposition of homogeneous thin films [24,35] with a large refractive index contrast with respect to the substrate (n SiO2 ≈ 1.44 at 1.53 µm). The structure of film glasses is characterized by an increase on the relative concentration of [TeO 3 ] groups and a decrease of the glass network connectivity with respect to the bulk glass that is evidenced by the increase of the I C /I B ratio and the decrease of the area of band associated to the vibration of symmetric Te-O-Te linkages (band A in Fig.…”

“…AFM measurements allowed determining the mean surface roughness (root mean squared, rms) of RT-and AN-films that is ~12 nm and ~8 nm, respectively, thus confirming that annealing treatments improve film quality. It is worth noting that the mean surface roughness of the RT-film is lower than the typical mean roughness (16 nm) reported for oxyfluoride silicate films synthesized by PLD at 200 ºC [24]. We have finally studied the mid-IR absorption spectrum of the different samples in order to analyse the evolution of OH -content upon film deposition and subsequent annealing.…”

“…Different chemical and physical methods have been attempted to produce RE doped thin film glasses such as sol-gel, chemical vapor deposition, sputtering or pulsed laser deposition (PLD) [21,22,23,24,25]. In particular, PLD has demonstrated to be a very versatile technique to produce thin films and it has been successfully applied to the synthesis of good quality tellurite, oxyfluoride silicate or phospho-tellurite glasses having a complex stoichiometry [24,26,27,28].…”

“…In particular, PLD has demonstrated to be a very versatile technique to produce thin films and it has been successfully applied to the synthesis of good quality tellurite, oxyfluoride silicate or phospho-tellurite glasses having a complex stoichiometry [24,26,27,28].…”

AI2O3:Er3+ as a gain platform for integrated optics

“…Because of these advantages, and the success of Er-doped glass fiber amplifiers and lasers, many glass host materials have been investigated for active planar devices. These include silica [18][19][20][21][22], phosphate glass [23][24][25][26][27][28][29][30][31][32], fluoride glass [33], aluminum oxide [34][35][36][37][38] and numerous multi-component glasses [39][40][41][42][43][44][45][46][47][48][49][50][51][52][53][54][55][56][57]. Glass hosts have relatively low refractive indices, which are closely matched to those of standard optical fibers.…”