Erratum: Refractive index of water and steam as function of wavelength, temperature and density [
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Schiebener, Peter; Straub, Johannes; Sengers, J. V.; Gallagher, J. S.

doi:10.1063/1.555850

Cited by 56 publications

(66 citation statements)

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“…4 cannot be explained by the wavelength dependence of the refractive index of water, which shows a change of less than 1% on going from 450 to 900 nm. 17 Enhanced backscattering ͑EBS͒ measurements on these samples showed that the transport mean free paths are in the micron regime and that sample B scatters light more strongly than sample A. This is in agreement with results obtained here.…”

supporting

confidence: 90%

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Electroluminescence as internal light source for measurement of the photonic strength of random porous GaP

Driel

Vanmaekelbergh

Kelly

2004

Applied Physics Letters

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During porous etching of GaP, electroluminescence ranging from the ultraviolet to the near-infrared is generated at the interface of the porous and the nonporous layer. This is used to measure the wavelength-dependent transmission of light through porous layers in a wide thickness range. Two types of porous structures, characterized by different pore sizes, were studied. The transmission of the emitted light gives valuable information about wavelength-dependent diffusion of light through porous GaP.

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confidence: 90%

“…For the experiments 300 m thick n-type GaP wafers, supplied by Groupe Arnaud Electronics and Hewlett Packard, with a ͑100͒ surface orientation and a ͑sulphur͒ doping density of 10-20ϫ10 17 cm Ϫ3 ͑sample A͒ and 7ϫ10 17 cm Ϫ3 ͑sample B͒ were used. Pieces of ϳ6ϫ6 mm were cut and glued on a copper plate with a conductive adhesive paste.…”

mentioning

confidence: 99%

Electroluminescence as internal light source for measurement of the photonic strength of random porous GaP

Driel

Vanmaekelbergh

Kelly

2004

Applied Physics Letters

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“…verification of the dispersion and higher order derivatives with astronomical interferometry [71], 5. review formulas [14,35,55,63], 6. theoretical summation of electronic transitions [16,30,31,46].…”

Section: Scopementioning

confidence: 99%

Refractive index of humid air in the infrared: model fits

Mathar¹

2007

J. Opt. A: Pure Appl. Opt.

111

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The theory of summation of electromagnetic line transitions is used to tabulate the Taylor expansion of the refractive index of humid air over the basic independent parameters (temperature, pressure, humidity, wavelength) in five separate infrared regions from the H to the Q band at a fixed percentage of Carbon Dioxide. These are least-squares fits to raw, highly resolved spectra for a set of temperatures from 10 to 25 • C, a set of pressures from 500 to 1023 hPa, and a set of relative humidities from 5 to 60%. These choices reflect the prospective application to characterize ambient air at mountain altitudes of astronomical telescopes. The paper provides easy access to predictions of the refractive index of humid air at conditions that are typical in atmospheric physics, in support of ray tracing [5] and astronomical applications [4,16,47,50] until experimental coverage of the infrared wavelengths might render these obsolete. The approach is in continuation of earlier work [46] based on a more recent HITRAN database [60] plus more precise accounting of various electromagnetic effects for the dielectric response of dilute gases, as described below.The literature of optical, chemical and atmospheric physics on the subject of the refractive index of moist air falls into several categories, sorted with respect to decreasing relevance (if relevance is measured by the closeness to experimental data and the degree of independence to the formalism employed here):1. experiments on moist air in the visible [3,9,18,53 [42,61,79] and eventually in the static limit [24], the refractive index plotted as a function of wavelength is more and more structured by individual lines. Since we will not present these functions at high resolution but smooth fits within several bands in the infrared, their spiky appearance sets a natural limit to the far-IR wavelength regions that our approach may cover. II. DIELECTRIC MODEL A. MethodologyThe complex valued dielectric function n(ω) of air n = 1 +χ (1) is constructed from molecular dynamical polarizabilitiesN m are molecular number densities, S ml are the line intensities for the transitions enumerated by l. ω 0ml are the transition angular frequencies, Γ ml the full linewidths at half maximum. c is the velocity of light in vacuum, and i the imaginary unit. The line shape (2) adheres to the complex-conjugate symmetry χ m (ω) = χ * m (−ω), as required for functions which are real-valued in the time domain. The sign convention of Γ ml merely reflects a sign choice in the Fourier Transforms and carries no real significance; a sign in the Kramers-Kronig formulas is bound to it. The integrated imaginary part is [28] whereν = k/(2π) = ω/(2πc) = 1/λ is the wavenumber.

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“…With further separation from the absorption edge however, the refractive index decreases. Measurements of the refractive index of water indicate that a value near 1.39 can be expected [14]. The Talbot interferometric lithography system described in Section 2 was modified for use with a KrF 248nm excimer fitted with extra-cavity spatial and temporal filtering can allow for a ~1mm temporal coherence length and ~5pm spectral bandwidth.…”

Section: Immersion Lithography At 248nmmentioning

confidence: 99%

Approaching the numerical aperture of water immersion lithography at 193-nm

Smith

Bourov²,

Fan

et al. 2004

SPIE Proceedings

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As immersion nanolithography gains acceptance for next generation device applications, experimental data becomes increasingly important. The behavior of resist materials, fluids, coatings, sources, and optical components in the presence of a water immersion media presents conditions unique compared to convention "dry" lithography. Several groups have initiated fundamental studies into the imaging, fluids, contamination, and integration issues involved with water immersion lithography at 193nm. This paper will present the status and results of the next stage of the development efforts carried out at RIT. The status of two systems are presented; a small field projection microstepper utilizing a 1.05 catadioptric immersion objective lens and a 0.50 to 1.26NA interferometric immersion exposure system based on a compact Talbot prism lens design. Results of the fundamental resolution limits of resist materials and of imaging optics are presented. Additionally, an exploration into the benefits of increasing the refractive index of water is addressed through the use of sulfate and phosphate additives. The potential of KrF, 248nm immersion lithography is also presented with experimental resist imaging results.

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Erratum: Refractive index of water and steam as function of wavelength, temperature and density [ J . P h y s . C h e m . R e f . D <

Cited by 56 publications

References 0 publications

Electroluminescence as internal light source for measurement of the photonic strength of random porous GaP

Electroluminescence as internal light source for measurement of the photonic strength of random porous GaP

Refractive index of humid air in the infrared: model fits

Approaching the numerical aperture of water immersion lithography at 193-nm

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