2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale 2013
DOI: 10.1109/3m-nano.2013.6737387
|View full text |Cite
|
Sign up to set email alerts
|

Error factors affecting the result of Laser Interference Lithography

Abstract: Laser Interference Lithography (LIL) techniques enable quantitative generation of periodic structures such as array of holes, dots and lines, which are the intrinsic structure in some optical functional material. In this paper, the most common errors factors that could affect the result of laser interference lithography were presented. The methods to enhance the quality of patterns of LIL also have been introduced.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

0
0
0

Publication Types

Select...

Relationship

0
0

Authors

Journals

citations
Cited by 0 publications
references
References 19 publications
0
0
0
Order By: Relevance

No citations

Set email alert for when this publication receives citations?