1974
DOI: 10.1016/0368-2048(74)85023-1
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ESCA studies of metal-oxygen surfaces using argon and oxygen ion-bombardment

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Cited by 471 publications
(124 citation statements)
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“…The observed binding energy, 853 eV, is in good agreement with that reported for Ni-metal, 852.9 eV (Kim et al, 1974). The aggressive chemical environment created in the etching experiment probably reduced Ni 2+ to Ni-metal, possibly via a Ni + intermediate which may have been responsible for the intermediate peak at 854 eV.…”
Section: Sorption Sites and Ion-etching Experimentssupporting
confidence: 86%
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“…The observed binding energy, 853 eV, is in good agreement with that reported for Ni-metal, 852.9 eV (Kim et al, 1974). The aggressive chemical environment created in the etching experiment probably reduced Ni 2+ to Ni-metal, possibly via a Ni + intermediate which may have been responsible for the intermediate peak at 854 eV.…”
Section: Sorption Sites and Ion-etching Experimentssupporting
confidence: 86%
“…A single Co 2p3/2 photopeak was discriminated for Co-hectorite, the average binding energy of which (unetched samples) was 782.6 eV. The appearance of a satellite peak at about 5 eV greater energy than the main peak suggests that the origin of the photopeak must be a high-spin Co 2 § species (McIntyre and Cook, 1975;Kim et al, 1974). The observed binding energy for Co-hectorite agrees well with that obtained for Co 2 § substituted in an octahedral (COO6) site in lusakite, 782.6 eV (Koppelman and Dillard, 1978).…”
Section: X-ray Photoelectron Spectroscopic Datamentioning
confidence: 99%
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“…The Ar + beam significantly affects the XPS spectrum in an energy range characteristic for bismuth. The phenomenon of metal reduction due to Ar + treatment was already observed for other metal oxides, e.g., CuO [51], TiO 2 [52,53], and MoO 3 [54]. In the case of electrooxidized samples, an additional peak marked as D at 532.4 eV has been found (see Fig.…”
Section: Xps Analysissupporting
confidence: 57%
“…В ранних работах (см., например, [23]), посвященных изучению закономерностей преимущественного распы-ления оксидов, не было обнаружено изменения стехио-метрического состава оксидов SiO 2 и Al 2 O 3 . Однако в более поздних работах такое изменение наблюдалось.…”
Section: обсуждение результатовunclassified