Volatile bis(tert-butylimido)-dichloromolybdenum-(VI) compounds containing N,N'-chelating ligands, ( t BuN) 2 MoCl 2 •L, have previously been used as single-source precursors for the chemical vapor deposition of high-purity Mo 2 N thin films. The first step in the thermolysis of these compounds is the partial dissociation of the chelating ligand to yield ( t BuN) 2 MoCl 2 , which further decomposes by eliminating isobutylene and t BuNH 2 . The rate-determining step in this process is the formation of a pentacoordinate intermediate where the previously bidentate ligand adopts a κ 1 -coordination. Here we show that rigidification of the ligand backbone, by incorporating various heterocycles, led to an overall increase in thermal stability (21−38 °C) of these complexes by preventing the formation of the κ 1 -intermediate. Formation of the κ 1 -intermediates is highlighted by high level calculations and is supported by experimental activation barriers. Finally, a model for the κ 1 -bipyridine adduct was isolated and characterized using 2-phenylpyridine. This careful control of the thermal stabilities of these compounds can lead to new vapor-phase deposition precursors for the preparation of Mo 2 N films.
* sı Supporting InformationThe Supporting Information is available free of charge at https://pubs.acs.org/doi/10.1021/acs.organomet.4c00084.Experimental details, synthesis of compounds, NMR spectra, TGA plots, DSC curves, additional crystallographic images, and computational data (PDF) Molecular structure of ( t BuN) 2 MoCl 2 (XYZ)
Accession CodesCCDC 2335568−2335571 contain the supplementary crystallographic data for this paper. These data can be obtained free of charge via www.ccdc.cam.ac.uk