The cyclized copolymers from N-cyclohexyldimethacrylamide (CHDMA) with t-butyl methacrylate (tBuMA) or tetrahydropyranyl methacrylate (THPMA) were synthesized. These copolymerizations occurred by general technique of radical polymerization and CHDMA mainly proceeded the cyclized reaction.The copolymers have high transmittance at 248 nm. These copolymers indicated high thermal property due to the cyclic structure in the main chain. The ester unit of the side chain was easily cleaved by baking with acid catalyst. The acid reaction was dependent on a number of methacrylate units and a kind of ester group. However, the cyclized unit from CHDMA was no changed on this process. We applied these copolymers to photoresist based on the chemically amplified system with PAG and obtained patterns of positive-tone image.