Estimation of background continuum emission intensity of inductively coupled plasma for correction of fast changing background

Chan, George C.-Y.; Chan, Wing-Shing

doi:10.1016/s0584-8547(02)00143-x

Cited by 5 publications

(3 citation statements)

References 27 publications

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“…The background continuum from a plasma arises from the interactions of free electrons with ions yielding recombinative radiation (free-bound transitions) and Bremsstrahlung emission due to freefree transitions, and can be described by the following equation [13,14], [15,16] and G = 1.…”

Section: Electron Temperaturementioning

confidence: 99%

Analysis of time-resolved laser plasma ablation using an imaging spectra technique

Luna¹,

Dardis²,

Doria³

et al. 2007

Braz. J. Phys.

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Pulsed laser deposition (PLD) is extensively employed for the growth of thin films. The laser-material interaction involves complex processes of heating, melting, vaporization, ejection of atoms, ions and molecules, shock waves, plasma initiation, expansion and deposition onto a substrate. The understanding of the spatial and temporal distribution of a plasma parameters in a laser-produced plasma is important to the control of thin film growth process. In this work we have studied the dynamics of laser ablated graphitic carbon plasma expanding into vacuum using a spectroscopic imaging suitable as an in situ & automated diagnostic sampling technique for PLD. Time-resolved spectra, that were also spatially resolved in one dimension along the axis of plasma expansion, were obtained using a time-gated intensified charge-coupled device (ICCD) coupled to a stigmatic Czerny-Turner spectrograph. Plasma parameters such as electron density, temperature and plume velocity expansion were extracted directly from the analysis of the C II (2s 2 3d-2s 2 4f) transition.

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Section: Electron Temperaturementioning

confidence: 99%

Analysis of time-resolved laser plasma ablation using an imaging spectra technique

Luna¹,

Dardis²,

Doria³

et al. 2007

Braz. J. Phys.

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“…A method has been proposed to estimate the continuum background emission in the ICP for any given set of excitation conditions. 385 The basis of the method is that the ratio of background continuum emission at two different plasma excitation conditions is a constant for all wavelengths, hence, if the conditions change, the new background emission at any wavelength can be calculated from the initial background emission at that wavelength and the emission at another convenient wavelength. Using this methodology, the authors utilised the ratio of differences in emission intensity, which they termed the 'f-factor', to background-subtract analyte emission, and compared it to the off-peak background correction method.…”

Section: Inductively Coupled Plasmasmentioning

confidence: 99%

Atomic spectrometry update. Advances in atomic emission, absorption and fluorescence spectrometry and related techniques

Evans

Day

Fisher

et al. 2004

J. Anal. At. Spectrom.

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“…Mathematical procedures have long been used to enhance ICP-OES measurements, − and various procedures have been utilized for background correction, − spectral interference removal, − and signal smoothing . However, procedures for obtaining optimal measurement positions are not common, and the signal maximum is generally considered the optimal measurement location.…”

mentioning

confidence: 99%

Determination of Uranium Isotopic Ratio by ICP-OES Using Optimal Sensitivity Position Analysis

Zeiri¹,

Fruchter

Elish³

et al. 2021

Anal. Chem.

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Isotopic composition analysis of natural and depleted uranium by inductively coupled plasma optical emission spectrometry (ICP-OES) requires the use of a high-resolution instrument due to the very slight isotopic shifts between the atomic emission spectra of the 238U and 235U isotopes. In this work, we show that conventional ICP-OES (without high-resolution optics) can be used for highly accurate uranium isotopic analysis, on par with the results obtained by ICP-MS. Such accurate measurements are achieved by applying a preparatory mathematical procedure termed the optimal sensitivity position (OSP) procedure. In the OSP procedure, a theoretical spectrum for 238U is constructed and subtracted from the measured spectra of calibration solutions encompassing various isotopic ratios. The resultant spectra are used to locate the optimal measurement positions for both major uranium isotopes (238U and 235U) and the background measurement position. Herein, the optimal measurement positions are revealed to be located not at each isotope’s peak maximum but at 424.427, 424.409, and 424.390 nm for 238U, 235U, and the background position, respectively. These locations remained stationary during the period of this work, implying that the use of a routine mathematical procedure is not required before every analysis. The OSP procedure offers a direct and highly accurate approach for determining the isotopic ratio of uranium in a relatively cheap and simple fashion. Furthermore, this work also demonstrates the possibility of greatly enhancing ICP-OES capabilities using mathematical analysis of spectra.

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Estimation of background continuum emission intensity of inductively coupled plasma for correction of fast changing background

Cited by 5 publications

References 27 publications

Analysis of time-resolved laser plasma ablation using an imaging spectra technique

Analysis of time-resolved laser plasma ablation using an imaging spectra technique

Atomic spectrometry update. Advances in atomic emission, absorption and fluorescence spectrometry and related techniques

Determination of Uranium Isotopic Ratio by ICP-OES Using Optimal Sensitivity Position Analysis

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