In this study, the possibility of utilizing a computer vision algorithm, i.e., demons registration, to accurately remap electron backscatter diffraction patterns for high resolution electron backscatter diffraction (HR-EBSD) applications is presented. First, the angular resolution of demons registration is demonstrated to be lower than the conventional cross-correlation based method, particularly at misorientation angles > 9˚. In addition, GPU acceleration has been applied to significantly boost the speed of iterative registration between a pair of patterns with 10° misorientation to under 1s. Second, demons registration is implemented as a first-pass remapping, followed by a second pass cross-correlation method, which results in angular resolution of ~0.5 × 10 -4 degrees, a phantom stress value of ~35MPa and phantom strain of ~2× 10 -4 , on dynamically simulated patterns, without the need of implementing robust fitting or iterative remapping. Lastly, the new remapping method is applied to a large experimental dataset collected from an as-built additively-manufactured Inconel 625 cube, which shows significant residual stresses built-up near the large columnar grain region and regularly arranged GND structures.