2010
DOI: 10.1364/oe.18.027136
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Estimation of relative defect densities in InGaN laser diodes by induced absorption of photoexcited carriers

Abstract: Defects are one of the most important factors influencing the optical properties of groups III-V nitride semiconductor materials and thereby their applicability to light-emitting diodes. In this paper, we demonstrate that it is possible to estimate the presence of defects in InGaN laser diodes by performing pump-probe measurements and observing the induced absorptions. We have confirmed that the induced absorption originates from defects by performing experiments in which the pump intensity is varied. We belie… Show more

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Cited by 7 publications
(5 citation statements)
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“…In addition, there is a probability that some of the probe photons are absorbed by the trapped electrons, having a long lifetime, in the sub-bandgap states. This absorption induces a transition of the trapped electron into the upper conduction band states, 33 depicted as transition a 3 by superimposing a E−k diagram in Figure 1d; here, E t is the trap energy level. This probe-induced absorption leads to a gradual shift of negative Δα to a positive Δα at the GaN band edge.…”
Section: ■ Experimental Sectionmentioning
confidence: 99%
“…In addition, there is a probability that some of the probe photons are absorbed by the trapped electrons, having a long lifetime, in the sub-bandgap states. This absorption induces a transition of the trapped electron into the upper conduction band states, 33 depicted as transition a 3 by superimposing a E−k diagram in Figure 1d; here, E t is the trap energy level. This probe-induced absorption leads to a gradual shift of negative Δα to a positive Δα at the GaN band edge.…”
Section: ■ Experimental Sectionmentioning
confidence: 99%
“…9,10 Defects can also introduce electronic traps (defect states) in the bandgap, which could affect the luminescence spectrum of a laser device. 10,11 Thus, a defect-free III-V buffer layer is crucial for the high performance of optoelectronic devices. It is particularly important to avoid anti-phase boundaries (APBs) in the III-V buffer layers, at which charge carriers can be trapped 12,13 and recombined by the formation of doubleatomic steps 14 on Ge(100) surfaces.…”
Section: ■ Introductionmentioning
confidence: 99%
“…An atomically abrupt and well-ordered III-V/Ge(100) heterointerface is the key to prevent crystalline defects originating from the heterointerface. Defects present in the III-V epitaxial layers commonly act as non-radiative recombination centers, which reduce photon emission efficiency. , Defects can also introduce electronic traps (defect states) in the bandgap, which could affect the luminescence spectrum of a laser device. , Thus, a defect-free III-V buffer layer is crucial for the high performance of optoelectronic devices. It is particularly important to avoid anti-phase boundaries (APBs) in the III-V buffer layers, at which charge carriers can be trapped , and recombined by the formation of double-atomic steps on Ge(100) surfaces.…”
Section: Introductionmentioning
confidence: 99%
“…For decades, the researchers were striving their efforts on reducing the threshold current [1][2][3][4][5], improving the output power [6][7][8][9], and expanding the wavelength range [10][11][12][13][14] among other things. They focus their attentions mainly on the behavior of LDs above the threshold region.…”
Section: Introductionmentioning
confidence: 99%