Etch characteristics of cobalt thin films using high density plasma of CH3COCH3/Ar gas mixture

Baek, Geum Bin; Oh, Kyung Ho; Chung, Chee Won

doi:10.1016/j.mee.2024.112260

Microelectronic Engineering

2024

DOI: 10.1016/j.mee.2024.112260

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Etch characteristics of cobalt thin films using high density plasma of CH3COCH3/Ar gas mixture

Geum Bin Baek,

Kyung Ho Oh,

Chee Won Chung

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Etch characteristics of cobalt thin films using high density plasma of CH3COCH3/Ar gas mixture

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References 23 publications

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