2024
DOI: 10.1007/s11090-024-10498-0
|View full text |Cite
|
Sign up to set email alerts
|

Etch Rate Uniformity Monitoring for Photoresist Etch Using Multi-channel Optical Emission Spectroscopy and Scanning Floating Harmonic Probe in an Inductively Coupled Plasma Reactor

Sanghun Lee,
Sanghee Han,
Jaehyeon Kim
et al.
Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

0
0
0

Publication Types

Select...

Relationship

0
0

Authors

Journals

citations
Cited by 0 publications
references
References 54 publications
0
0
0
Order By: Relevance

No citations

Set email alert for when this publication receives citations?