Etch rates of (100), (111) and (110) single-crystal silicon in TMAH measured in situ by laser reflectance interferometry

Steinsland, E.; Finstad, T. G.; Hanneborg, A.

doi:10.1016/s0924-4247(00)00309-5

Cited by 45 publications

(31 citation statements)

References 10 publications

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“…The anisotropic etchants etch materials much faster in one direction than in another, exposing the slowest etching crystal planes over time [1,2,4,10,[23][24][25][26][27]. Several kinds of aqueous alkaline solutions such as potassium hydroxide solution (KOH) [23][24][25][26][28][29][30][31][32][33][34][35], tetramethylammonium hydroxide (TMAH) [27,[36][37][38][39][40][41][42][43][44][45], ethylenediamine pyrocatechol water (EDP or EPW) [26,35,46,47], hydrazine [23,48,49], ammonium hydroxide [50], and cesium hydroxide (CsOH) [51] are employed for silicon wet anisotropic etching. Among these etchants, potassium hydroxide (KOH) and tetramethylammonium hydroxide (TMAH) are most frequently used.…”

Section: Introductionmentioning

confidence: 99%

A comprehensive review on convex and concave corners in silicon bulk micromachining based on anisotropic wet chemical etching

Pal

Sato

2015

Micro and Nano Syst Lett

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Section: Introductionmentioning

confidence: 99%

A comprehensive review on convex and concave corners in silicon bulk micromachining based on anisotropic wet chemical etching

Pal

Sato

2015

Micro and Nano Syst Lett

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“…1(a)] [11]. Note that the KOH-based texturing produces random standing and tilted pyramids on the LPC Si surface due to anisotropic nature of the etchant on poly-Si films [16], [17]. To enhance rear reflection, a white paint BSR is spray-coated onto the textured Si films until the sample is completely opaque.…”

Section: Methodsmentioning

confidence: 99%

Enhanced Absorption in Laser-Crystallized Silicon Thin Films on Textured Glass

Pakhuruddin

Huang

Dore

et al. 2016

IEEE J. Photovoltaics

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This paper reports enhanced absorption in lasercrystallized Si thin films on abrade-textured glass. The Si film on textured glass has large high-quality grains of several hundred micrometers in width and up to several centimeters in length. A combination of glass texturing, rear Si texturing, white paint rear reflector, and front moth-eye antireflection foil on a 10-μm-thick Si film (on SiO x /SiN x /SiO x intermediate layer) shows a large broadband absorption enhancement with potential short-circuit current densities up to 29.5 mA/cm 2 (26.1% enhancement as compared with a planar reference).

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“…The oxide deposition rate was about 1.5 nm/min and the gas flow rate of 18 sccm. After the oxidization and patterning, the residual silicon was removed by an anisotropic etchant, tetramethylammoniumhydroxide (TMAH) + deionized water, at 80°C for 45 min [6]. Secondly, micro-cantilever arrays were deposited with chrome-gold layer using radio frequency (rf ) magnetron sputtering from a gold target at room temperature.…”

Section: Methodsmentioning

confidence: 99%

Geometrical parameters measurement of surface functionalized micromachined micro-cantilever using optical method

Kurhekar

Apte

2012

Int Nano Lett

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Micro-cantilever arrays with different dimensions are fabricated by micromachining technique onto silicon <1 0 0> substrate. These sputtered gold-coated micro-cantilevers were later surface-functionalized. Scanning electron microscopy (SEM), atomic force microscopy (AFM), and optical diffraction with laser source are employed to characterize the morphology and image measurement of the micro-cantilever arrays, respectively. The spatial resolution produced in the proposed image measurement method is approaching 1 μm, and the repeatable precision is confirmable in nanometers. Compared with conventional AFM and SEM measurement techniques, the proposed method has demonstrated sufficient flexibility, repeatability, and reliability. The experimental results have been analyzed and presented in this paper for MEMS micro-cantilevers. The scanning white light interferometrybased, two-point high-resolution optical method is presented for characterizing micro-cantilevers and other MEMS microstructures. In this piece of work, we investigate the microstructure fabrication and image measurement of geometrical parameters such as length, width, and step height of micro-cantilevers fabricated using bulk micromachining technique onto silicon <100> substrate.

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Etch rates of (100), (111) and (110) single-crystal silicon in TMAH measured in situ by laser reflectance interferometry

Cited by 45 publications

References 10 publications

A comprehensive review on convex and concave corners in silicon bulk micromachining based on anisotropic wet chemical etching

A comprehensive review on convex and concave corners in silicon bulk micromachining based on anisotropic wet chemical etching

Enhanced Absorption in Laser-Crystallized Silicon Thin Films on Textured Glass

Geometrical parameters measurement of surface functionalized micromachined micro-cantilever using optical method

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