2013
DOI: 10.1016/j.matchemphys.2013.04.042
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Ethyl group as matrix modifier and inducer of ordered domains in hybrid xerogels synthesised in acidic media using ethyltriethoxysilane (ETEOS) and tetraethoxysilane (TEOS) as precursors

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Cited by 24 publications
(37 citation statements)
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“…The most widely adopted approach to hybrid xerogel synthesis is the sol–gel method [ 19 ], using either (i) “silane coupling agents” to provide a functional surface group that can be substituted or act as a bridge to other structural units [ 3 , 10 , 11 , 15 ] or (ii) co-condensation reactions or condensation between monomers of silicon tetraalkoxides (e.g., tetramethoxy- or tetraethoxysilane (TMOS, TEOS)) and one or more mono-, di-, or tri-alkylalkoxysilanes (R x Si(OR’) 4-x ). This procedure yields hybrid silicon materials based on a silica matrix with organic groups that modify the network, permitting the production of materials with specifically designed chemical and textural properties in a single process [ 20 , 21 , 22 ]. The incorporation of organic groups is known to promote the formation of ordered domains induced by intermolecular forces (e.g., hydrogen bonds, hydrophobic or electrostatic interactions, or π–π stacking) [ 23 ].…”
Section: Introductionmentioning
confidence: 99%
“…The most widely adopted approach to hybrid xerogel synthesis is the sol–gel method [ 19 ], using either (i) “silane coupling agents” to provide a functional surface group that can be substituted or act as a bridge to other structural units [ 3 , 10 , 11 , 15 ] or (ii) co-condensation reactions or condensation between monomers of silicon tetraalkoxides (e.g., tetramethoxy- or tetraethoxysilane (TMOS, TEOS)) and one or more mono-, di-, or tri-alkylalkoxysilanes (R x Si(OR’) 4-x ). This procedure yields hybrid silicon materials based on a silica matrix with organic groups that modify the network, permitting the production of materials with specifically designed chemical and textural properties in a single process [ 20 , 21 , 22 ]. The incorporation of organic groups is known to promote the formation of ordered domains induced by intermolecular forces (e.g., hydrogen bonds, hydrophobic or electrostatic interactions, or π–π stacking) [ 23 ].…”
Section: Introductionmentioning
confidence: 99%
“…A recent study on ormosil xerogels obtained from hydrolysispolycondensation of TEOS with ethyltrietoxysilane (ETES) in acidic media showed that the presence of the diffraction peak at 2q < 10 was directly related to the ETES/TEOS ratio, indicating that the formation of octasilsesquioxanes oligomers is induced by organo-trialkoxysilanes precursors [25]. It is known that during the hydrolysis-polycondensation of TEOS in acidic media, the condensation step occurs preferentially at the chain termination of the oligomers such that the intermolecular condensation is favored.…”
Section: Long-range Order and Crystallinitymentioning
confidence: 99%
“…Sendo sensível apenas à estrutura local de primeiros e segundos vizinhos ela poder ser aplicada mesmo em materiais não- Outro pico que merece destaque aparece por volta de 6,4º correspondendo à distância de correlação aproximada de 1,4 nm. Picos de difração na região de 2θ < 10º já foram observados em matrizes do tipo Ormosil, sendo atribuídos a distância entre unidades discretas de poliedros octaméricos de silsesquioxanos (Figura 23) [70,71]. Difratogramas bastante similares aos aqui apresentados foram observados por Perrin e colaboradores para amostras semi-cristalinas de octasilsesquioxanos substituídos nas extremidades com diferentes grupos alquílicos [72].…”
Section: Espectroscopia De Absorção De Raios-x Na Região Em Torno Da unclassified
“…De maneira geral, Perrin observou difratogramas constituídos por um pico largo de difração em 8º e halos amorfos sobrepostos por volta de 20º e 27º. As distâncias [70]. Sabe-se que a condensação dos produtos de hidrólise do TEOS em meio ácido ocorre preferencialmente nas extremidades dos oligômeros, de forma que a condensação intermolecular é favorecida [3,6].…”
Section: Espectroscopia De Absorção De Raios-x Na Região Em Torno Da unclassified
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