1989
DOI: 10.1051/rphysap:01989002403036900
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Etude de la passivation de l'InP-n en plasmas RF et multipolaire d'oxygène

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“…The anneal was performed after the deposition at the top of Au contact in order to improve the quality of the oxide and the interfacial layer. [17][18][19] MIS samples oxided by air are also used in this study. There are samples A and B ͑the oxide thickness is 35 Å for sample A and 45 Å for sample B͒.…”
Section: Methodsmentioning
confidence: 99%
“…The anneal was performed after the deposition at the top of Au contact in order to improve the quality of the oxide and the interfacial layer. [17][18][19] MIS samples oxided by air are also used in this study. There are samples A and B ͑the oxide thickness is 35 Å for sample A and 45 Å for sample B͒.…”
Section: Methodsmentioning
confidence: 99%