2004
DOI: 10.12693/aphyspola.106.215
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(Eu,Gd)Te - MBE Growth and Characterization

Abstract: Monocrystalline thin layers of (Eu,Gd)Te, n-type ferromagnetic semiconductor, were grown by molecular beam epitaxy technique on BaF2 (111) substrates. Reflection high-energy electron diffraction, X-ray diffraction, and atomic force microscopy characterization proved epitaxial mode of growth and high crystal quality of the layers. Magnetic susceptibility and magnetic resonance measurements showed that in (Eu,Gd)Te layers ferromagnetic transition takes place at about 13 K. Electrical characterization carried out… Show more

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(4 citation statements)
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“…A maximum was observed in the temperature dependence of resistivity at the Curie temperature directly showing a correlated behaviour of magnetic and electrical properties of n-(Eu,Gd)Te layers. These layers exhibit also negative magnetoresistance (over 90% at magnetic field of 10 T at temperatures below and close to T C ) related to the suppression by external magnetic field of the scattering on magnetic ions [7].…”
Section: Magnetic and Electrical Characterizationmentioning
confidence: 99%
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“…A maximum was observed in the temperature dependence of resistivity at the Curie temperature directly showing a correlated behaviour of magnetic and electrical properties of n-(Eu,Gd)Te layers. These layers exhibit also negative magnetoresistance (over 90% at magnetic field of 10 T at temperatures below and close to T C ) related to the suppression by external magnetic field of the scattering on magnetic ions [7].…”
Section: Magnetic and Electrical Characterizationmentioning
confidence: 99%
“…The intensity oscillations of the RHEED specular spot allowed to determine the rates of growth as equal to 0.1 ML/s for (Eu,Gd)Te and 0.6 ML/s for PbTe (ML is monolayer thickness). The MBE growth conditions for (Eu,Gd)Te layers are discussed in more detail in [7].…”
Section: Growth and Structural Characterizationmentioning
confidence: 99%
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