the performance of semiconductor devices. In conventional silicon-based devices, doping is widely employed as an effective way to tune the device performance. In general, doping can tune the electrical properties of semiconductors such as carrier density, Fermi level, and mobility to optimize device performance. [1] Typically, a higher hole density is obtained for p-doped Si, and a higher electron density is obtained for n-doped Si. [2] In recent years, new semiconductors have flourished, such as 2D semiconductors, [3] organic semiconductors (OSCs), [4] perovskite semiconductors, [5] etc. Among them, perovskite semiconductors have been heavily studied for their excellent optoelectronic property, especially in the field of solar cells and light-emitting devices. In addition, perovskite semiconductors are also quite promising in the application of FETs due to their high intrinsic mobilities over 100 cm 2 V −1 s −1 measured by terahertz techniques. [6] However, obtaining perovskite FETs that can function well at room temperature is challenging, which is attributed to the partially screened gate electric field by ion migration. [7] 2D Ruddlesden-Popper perovskites are considered an exceptional option to alleviate the ion migration problem due to their unique layered structures, where bulky organic chains can inhibit the ion migration along the direction perpendicular toThe development of techniques for tuning/controlling the properties of electronic devices such as field-effect transistors (FETs) is important for the optimization of device performance or the realization of custom-designed device functions. Here, a simple method for tuning the performance of 2D perovskite ((PEA) 2 SnI 4 ) FETs by transferring organic semiconductor PDVT-10 films onto (PEA) 2 SnI 4 films to form van der Waals heterojunctions (vdWHs) is presented. By varying the electrical properties of PDVT-10 with doping technique, the performance of (PEA) 2 SnI 4 FETs can be effectively tuned in terms of on-state current, threshold voltage, and mobility, with mobility increased from 0.10 cm 2 V −1 s −1 for pristine (PEA) 2 SnI 4 FETs to 0.46 cm 2 V −1 s −1 for the vdWH-based FETs. This phenomenon can be attributed to the holes transfer occurring at heterojunction interface. More interestingly, the performance of the (PEA) 2 SnI 4 FETs can be almost fully recovered once the PDVT-10 films are removed, indicating the reversibility of the method. Such method of tuning semiconductor device performance by forming vdWHs can be also extended to other semiconductors and devices.