2016
DOI: 10.1117/12.2219127
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EUV blank defect and particle inspection with high throughput immersion AFM with 1nm 3D resolution

Abstract: Inspection of EUV mask substrates and blanks is demanding. We envision this is a good target application for massively parallel Atomic Force Microscopy (AFM). We envision to do a full surface characterization of EUV masks with AFM enabling 1 nm true 3D resolution over the entire surface. The limiting factor to do this is in the sensor itself: throughput is limited by the time that a cantilever needs to adjust its oscillation amplitude to the surface topography while scanning. We propose to use heavily damped c… Show more

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Cited by 1 publication
(1 citation statement)
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“…Ambient conditions imaging comes along with the observation of effects of capillary forces. Such forces could have a detrimental effect in the case of a surface-sensitive force feedback technique like AFM (this not being the case for specialized high throughput techniques like immersion AFM [55]). Even for very small relative humidity, a thin water layer is adsorbed on hydrophilic surfaces.…”
Section: Ambient Imaging and The Effect Of Humiditymentioning
confidence: 99%
“…Ambient conditions imaging comes along with the observation of effects of capillary forces. Such forces could have a detrimental effect in the case of a surface-sensitive force feedback technique like AFM (this not being the case for specialized high throughput techniques like immersion AFM [55]). Even for very small relative humidity, a thin water layer is adsorbed on hydrophilic surfaces.…”
Section: Ambient Imaging and The Effect Of Humiditymentioning
confidence: 99%