EUV photofragmentation and oxidation of a polyarylene – Sulfonium resist: XPS and NEXAFS study

Belmonte, Guilherme Kretzmann; Moura, Cleverson Alves da Silva; Reddy, Pulikanti Guruprasad; Gonsalves, Kenneth E.; Weibel, Daniel Eduardo

doi:10.1016/j.jphotochem.2018.06.005

Cited by 17 publications

(18 citation statements)

References 50 publications

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“…In particular, the soft X-ray energy range promotes electronic transitions from the carbon K-edge (1s orbital), which directly corresponds to the detection of changes in the carbon backbone of the organic ligands. [46][47][48] C K-edge NEXAFS spectroscopy was performed for the two materials, ZrMc and fluorine-doped ZrMcF. For each compound, a spectrum of the thin film before exposure to EUV light was recorded as reference (Fig.…”

Section: Resultsmentioning

confidence: 99%

Unravelling the effect of fluorinated ligands in hybrid EUV photoresists by X-ray spectroscopy

Bespalov

Witte

et al. 2020

J. Mater. Chem. C

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Section: Resultsmentioning

confidence: 99%

Unravelling the effect of fluorinated ligands in hybrid EUV photoresists by X-ray spectroscopy

Bespalov

Witte

et al. 2020

J. Mater. Chem. C

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“…In fact, the discharge current is basically unchanged under different delay conditions when the voltage is maintained. Compared with LTD and LPP spectra, the intensity of the LTD spectra at 7.2 and 6.76 nm was higher than shown in [7], which indicates that there are fewer satellites in LTD. As seen in Figure 8, the presence of resonance lines near 7.14 nm from Ag-like Gd 17+ , is clearly demonstrated by small intensity peaks in all spectra. It can be seen clearly that the spectral intensity between 6.5 and 7.6 nm increases with the laser-current delay.…”

Section: Theoretical Calculationsmentioning

confidence: 68%

“…A reflective coefficient of 74.5% at 6.66 nm with LaN/B multilayer has been achieved [5], and changing the thickness of each bilayer can slightly tune the wavelength corresponding to maximum reflectance [6]. Moreover, the resist sensitivity has been evaluated for the beyond extreme ultraviolet BEUV source around 6.x nm [7,8].…”

Section: Introductionmentioning

confidence: 99%

Effect of Time Delay on Laser-Triggered Discharge Plasma for a Beyond EUV Source

Tian

Zhao

et al. 2019

Symmetry

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We demonstrate the beyond extreme ultraviolet (BEUV) emission by a laser-triggered discharge source with the laser-current delay between 0.6 µs and 3 µs. The spectra at different electron temperatures are simulated theoretically, and the spectra at different laser-current delays are measured experimentally. The theoretical and experimental results show that the lower vapor velocity at longer laser-current delay time is beneficial for increasing the steady-state time of plasma at high temperature, thereby increasing the output intensity and spectral purity of 6.76 nm. The radiation intensity of 6.76 nm (0.6% bandwidth) increases about 240% when the delay increases from 0.6 to 3 μs.

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“…40,41 Absorption of EUV photons is a not resonant process, and a high stability of the aromatic section of the resists was found in spite of the studied resists containing heavy metal atoms to enhance the absorption of EUV photons. In particular, in the EUV irradiation of a polyarylene-sulfonium resist (PAS), 41 the aromatic sections of the polymer remained almost intact even after 15 min of continuous irradiation at 103.5 eV. In those experiments, the sizing dose used was more than 60 times higher than is usually used in EUV lithography.…”

Section: Introductionmentioning

confidence: 99%

“…The results presented here are very interesting taking into account our very recent work carried out using EUV excitation at 103.5 eV. 40,41 Absorption of EUV photons is a not resonant process, and a high stability of the aromatic section of the resists was found in spite of the studied resists containing heavy metal atoms to enhance the absorption of EUV photons. In particular, in the EUV irradiation of a polyarylene-sulfonium resist (PAS), 41 the aromatic sections of the polymer remained almost intact even after 15 min of continuous irradiation at 103.5 eV.…”

Section: Introductionmentioning

confidence: 99%

Polarization Dependence in the Carbon K-Edge Photofragmentation of MAPDST Photoresist: An Experimental and Theoretical Study

et al. 2018

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The use of tunable soft X-rays from synchrotron radiation (SR) opens the possibility of inducing selective chemical bond scission because of its high localization in a chemical bond. The selective fragmentation of a potential extreme ultraviolet resist, poly(4-(methacryloyloxy) phenyldimethylsulfoniumtriflate) (MAPDST), was examined using inner shell-polarized SR excitation. Selective bond dissociation processes were studied using a combination of carbon K-edge excitation, angle-resolved irradiation, and near-edge X-ray absorption fine structure (NEXAFS) spectroscopy. Detailed theoretical calculations carried out with the FEFF9 modeling program allowed the interpretation of all the observed experimental features. NEXAFS results indicated that the aromatic group of the polymer lies parallel to the substrate surface. FEFF9 theoretical calculations confirmed the origin of the splitting of the main C 1s → πCC * resonances observed. The transition C 1s → παCC * (285.3 eV) can be associated with the four internal carbons of the aromatic ring. The transition C 1s → πβCC * (286.9 eV) was assigned to the carbon atoms attached to the oxygen and sulfur atoms. According to the theoretical calculations, the origin of the splitting is due to the different absolute energy of C 1s. The results showed a strong selective dissociation effect when the excitation energy was tuned to the C 1s → παCC * transition and the electric field vector of the photon was perpendicular to the substrate plane (grazing angle). On the contrary, other transitions were in general less affected. When the SR irradiation angle changed from grazing to normal incidence, the intensity of the C 1s → πCC * transitions was almost unaffected by 285.3 eV photons. The experimental results suggest that site-specific core excitation combined with the direction of the electric field vector of the incidence SR can efficiently control the localization of the photon energy to produce selective bond dissociation in MAPDST thin films. The results presented here can also be useful to guide new processing lithographic methods for extreme ultraviolet lithography using the polarization properties of light in ordered polymeric thin films.

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EUV photofragmentation and oxidation of a polyarylene – Sulfonium resist: XPS and NEXAFS study

Cited by 17 publications

References 50 publications

Unravelling the effect of fluorinated ligands in hybrid EUV photoresists by X-ray spectroscopy

Unravelling the effect of fluorinated ligands in hybrid EUV photoresists by X-ray spectroscopy

Effect of Time Delay on Laser-Triggered Discharge Plasma for a Beyond EUV Source

Polarization Dependence in the Carbon K-Edge Photofragmentation of MAPDST Photoresist: An Experimental and Theoretical Study

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