EUV sources for Lithography

Richardson, Martin

doi:10.1109/leos.2007.4382489

LEOS 2007 - IEEE Lasers and Electro-Optics Society Annual Meeting Conference Proceedings

2007

DOI: 10.1109/leos.2007.4382489

|View full text |Cite

EUV sources for Lithography

Martin Richardson

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

Supporting

Mentioning

Contrasting

Year Published

2009

2013

Publication Types

Select...

Article2

Relationship

Self Cite0

Independent2

Authors

Journals

Cited by 2 publications

(1 citation statement)

References 6 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…We report calculations using a model that includes a collisional-radiative (CR) solver 4 and a modified one-dimensional hydrodynamic code MEDUSA 5 coupled with an atomic code relevant to the conditions in mass-limited laser-based EUV sources. 6,7 The CR solver includes all of the electric dipole transitions among the most important singly excited-states configurations in the Kr ð0À13Þþ ; Gd ð10À26Þþ , and Tb ð10À28Þþ charge states using detailed atomic data obtained from the relativistic Flexible Atomic Code (FAC) including the effect of configuration interactions. 8 The latter, primarily accounting for the effect of electron correlations among transitions with the same principal quantum number, causes a strong spectral narrowing.…”

mentioning

confidence: 99%

Laser-plasma source parameters for Kr, Gd, and Tb ions at 6.6 nm

Masnavi

Szilagyi

Parchamy

et al. 2013

Applied Physics Letters

View full text Add to dashboard Cite

There is increasing interest in extreme-ultraviolet (EUV) laser-based lamps for sub-10-nm lithography operating in the region of 6.6 nm. A collisional-radiative model is developed as a post-processor of a hydrodynamic code to investigate emission from resonance lines in Kr, Gd, and Tb ions under conditions typical for mass-limited EUV sources. The analysis reveals that maximum conversion efficiencies of Kr occur at 5×1010W/cm2, while for Gd and Tb it was ≃0.9%/2πsr for laser intensities of (2−5)×1012W/cm2.

show abstract

mentioning

confidence: 99%

Laser-plasma source parameters for Kr, Gd, and Tb ions at 6.6 nm

Masnavi

Szilagyi

Parchamy

et al. 2013

Applied Physics Letters

View full text Add to dashboard Cite

show abstract

Highly efficient sparse-matrix inversion techniques and average procedures applied to collisional-radiative codes

Poirier¹,

Dortan²

2009

High Energy Density Physics

View full text Add to dashboard Cite

The behavior of non-local thermal-equilibrium (NLTE) plasmas plays a central role in many fields of modern-day physics, such as laser-produced plasmas, astrophysics, inertial or magnetic confinement fusion devices, or X-ray sources. The proper description of these media in stationary cases requires to solve linear systems of thousands or more rate equations. A possible simplification for this arduous numerical task may lie in some type of statistical average, such as configuration or superconfiguration average. However to assess the validity of this procedure and to handle cases where isolated lines play an important role, it may be important to deal with detailed levels systems. This involves matrices with sometimes billions of elements, which are rather sparse but still involve thousands of diagonals.We propose here a numerical algorithm based on the LU decomposition for such linear systems. This method turns out to be orders of magnitude faster than the traditional Gauss elimination. And at variance with alternate methods based on conjugate gradients or minimization, no convergence or accuracy issues have been faced. Some examples are discussed in connection with the krypton and tungsten cases discussed at the last NLTE meeting. Furthermore, to assess the validity of configuration average, several criteria are discussed. While a criterion based on detailed balance is relevant in cases not too far from LTE but insufficient otherwise, an alternate criterion based on the use of a fictive configuration temperature is proposed and successfully tested. It appears that detailed calculations are sometimes necessary, which supports the search for an efficient solver as the one proposed here.

show abstract

scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.

Contact Info

customersupport@researchsolutions.com

10624 S. Eastern Ave., Ste. A-614

Henderson, NV 89052, USA

This site is protected by reCAPTCHA and the Google Privacy Policy and Terms of Service apply.

Blog Terms and Conditions API Terms Privacy Policy Contact Cookie Preferences Do Not Sell or Share My Personal Information

Made with 💙 for researchers

Part of the Research Solutions Family.

EUV sources for Lithography

Cited by 2 publications

References 6 publications

Laser-plasma source parameters for Kr, Gd, and Tb ions at 6.6 nm

Laser-plasma source parameters for Kr, Gd, and Tb ions at 6.6 nm

Highly efficient sparse-matrix inversion techniques and average procedures applied to collisional-radiative codes

Contact Info

Product

Resources

About