Evaluating the impact of microstructure modifications on thin film photoelectric properties

Abstract

Microstructure modifications on thin photoelectrical properties refers to changes in the microscopic structure of thin films that affect their ability to convert light into electricity. This study investigates the deposition and post-treatment effects in the electric and visual qualities of GZO, IZO, and ZnO thin layers, aiming to enhance their applicability in electronic and optoelectronic devices, according to the X-raydiffraction (XRD) examination. Thin films were deposited on glass substrates using magnetic sparking at thicknesses of 300 nm and 500 nm, followed by treatments like wet aging and annealing at 220 °C. The results showed significant improvements in crystallinity and optical characteristics, with ZnO films exhibiting a preferred (003) orientation. IZO films demonstrated notable mobility at 10.96 cm2/V-sec and resistivity of 2.49×10⁻3 ohm-cm. The novelty of this research is the novel integration of wet aging and low-temperature annealing, that notably improves thin film efficiency while maintaining structural integrity. The findings indicate that post-treatment significantly enhances the properties of these thin films, suggesting their potential for various electronic applications.