Evaluation of mechanical properties of Zr–Cu–Al–Ni TFMG using nanoindentation

Jeong, Uihwan; Han, Jungmoo; Marimuthu, Karuppasamy Pandian; Lee, Youngseo; Lee, Hyungyil

doi:10.1016/j.jmrt.2021.04.030

Cited by 11 publications

(3 citation statements)

References 61 publications

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“…In the biomedical field, the surface properties of materials are critical, including aspects such as corrosion resistance and mechanical compatibility. In recent years, thin-film metallic glasses (TFMGs) coatings have been shown to significantly improve the performance of materials [ [124] , [125] , [126] , [127] , [128] , [129] ]. PVD methods, such as sputtering and pulsed laser deposition (PLD), are effective manufacturing techniques for the preparation of such thin films [ 126 ].…”

Section: Surface Modified Pure Mg Bioimplantsmentioning

confidence: 99%

Surface engineering of pure magnesium in medical implant applications

Gong,

Yang,

et al. 2024

Heliyon

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Section: Surface Modified Pure Mg Bioimplantsmentioning

confidence: 99%

Surface engineering of pure magnesium in medical implant applications

Gong,

Yang,

et al. 2024

Heliyon

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“…Amorphous metals can be prepared using many methods, including liquid quenching [13], physical vapour deposition [14][15][16][17][18][19][20][21][22], and chemical solution reaction [23]. Among these methods, liquid-phase quenching and physical vapour deposition are commonly used.…”

Section: Introductionmentioning

confidence: 99%

“…The film hardness has an evident positive dependence on the working pressure. Jeong et al [22] evaluated the effects of the thickness of ZrAlNiCu films on material properties. It was demonstrated the elastic modulus decreased with film thickness.…”

Section: Introductionmentioning

confidence: 99%

Structure and characteristic studies of ZrAlNiCu films prepared by magnetron sputtering

Tsai

Chen

Huang

et al. 2023

Materials Science and Technology

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This study explores the influence of process parameters on the structural, mechanical, and electrical properties of ZrAlNiCu alloy and nitride film obtained by magnetron sputtering of a single Zr51Al11Ni4Cu34 target. Selected variables affecting the process are working pressure, substrate temperature, and nitrogen partial pressure. Almost all films are amorphous except for nitride films deposited at moderate nitrogen partial pressure, which consist of the FCC-ZrN nanophase. A low working pressure and high substrate temperature result in refined boundary interfaces, thus increasing their hardness and electrical conductivity. Nitride films have higher hardness and lower electrical conductivity than alloy films because of their strong ionic metal-N bonding. Thus, the formation of FCC-ZrN nanocrystals is conducive to the further improvement of hardness.

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