Evaluation of Outermost Surface Temperature of Silicon Substrates during UV-Excited Ozone Oxidation at Low Temperature

Kameda, Naoto; Nishiguchi, Tetsuya; Morikawa, Yoshiki; Kekura, Mitsuru; Nakamura, Ken; Ushiyama, T.; Nonaka, Hidehiko; Ichimura, Shingo

doi:10.2116/analsci.26.273

ANAL. SCI.

2010

DOI: 10.2116/analsci.26.273

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Evaluation of Outermost Surface Temperature of Silicon Substrates during UV-Excited Ozone Oxidation at Low Temperature

Naoto Kameda

Tetsuya Nishiguchi

Yoshiki Morikawa

et al.

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2013

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Surface-Treatment Methods Using Ozone

Kurokawa¹

2013

J. Vac. Soc. Jpn.

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Surface-treatment methods using ozone, such ozone gas treatment with UV light irradiation, immersion in ozone diluted water, and exposure to ozone gas are discussed herein. The objectives of performing ozone surface treatments are to reduce carbon-related contamination on the surface, prepare a clean substrate surface to fabricate a thin-ˆlm stacking with sharp interfaces, oxidize a surface to form high-quality oxide thinˆlms, and passivate a metal surface to increase its corrosion resistance. These objectives are achieved because of the high oxidation ability of the ozone molecules and the oxygen radicals resulting from the ozone dissociation. Various applications of ozone surface treatment are also exempliˆed in this report to reveal their signiˆcant potential as surface-treatment tools. 308 18 308-()-J. Vac. Soc. Jpn.

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Surface-Treatment Methods Using Ozone

Kurokawa¹

2013

J. Vac. Soc. Jpn.

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Evaluation of Outermost Surface Temperature of Silicon Substrates during UV-Excited Ozone Oxidation at Low Temperature

Cited by 1 publication

References 11 publications

Surface-Treatment Methods Using Ozone

Surface-Treatment Methods Using Ozone

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