2016
DOI: 10.1016/j.surfcoat.2016.07.098
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Evaluation of Stoney equation for determining the internal stress of DLC thin films using an optical profiler

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Cited by 48 publications
(15 citation statements)
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“…This behaviour is in agreement with the FEM results of Guyot et al [20]. These results were presented in a different way in a previous study [21], and the experiments were reproduced by Shiri et al [22] in the case of DLC films, adding roundshape substrates. In opposition to the present results, they found for all substrate shapes a constant stress value of 760 MPa ± 100 MPa, about 5 times higher than in our study.…”
Section: Influence Of the Sample's Shape And Sizesupporting
confidence: 90%
“…This behaviour is in agreement with the FEM results of Guyot et al [20]. These results were presented in a different way in a previous study [21], and the experiments were reproduced by Shiri et al [22] in the case of DLC films, adding roundshape substrates. In opposition to the present results, they found for all substrate shapes a constant stress value of 760 MPa ± 100 MPa, about 5 times higher than in our study.…”
Section: Influence Of the Sample's Shape And Sizesupporting
confidence: 90%
“…Significant compressive residual stresses levels of a-C phases can initiate buckling and delamination under the operating conditions of PEMFCs, compromising their application. 38,39 A common means 40,41 of internal stress measurement is based on curvature measured before and after film deposition using the Stoney equation (eq 4): 1)…”
Section: ■ Experimental Methodsmentioning
confidence: 99%
“…As the thickness of an a-C layer increases, high levels of compressive internal stress has become a major concern compromising performance. Significant compressive residual stresses levels of a-C phases can initiate buckling and delamination under the operating conditions of PEMFCs, compromising their application. , A common means , of internal stress measurement is based on curvature measured before and after film deposition using the Stoney equation (eq ): where E s is Young’s modulus, ν s is the Poisson ratio, h s is the thickness of the substrate, h f is the thickness of the thin film, and R 0 and R are the curvature radii of samples before and after deposition, respectively. Curvature radii are measured by confocal laser scanning microscopy (KEYENCE) and are fitted by a circular arc.…”
Section: Experimental Methodsmentioning
confidence: 99%
“…The scanning angle ranged from 20 to 90° at a scanning speed of 2°/min. Moreover, after using residual stress tester (JLCST022, Korea) to measure the curvature radii of the CrN coatings deposited on the Si substrate (length–width ratio ≥ 10), the residual internal stress changes with coating growth were calculated by the Stoney equation. …”
Section: Methodsmentioning
confidence: 99%