Evaluation of thick-film resistor structural parameters based on noise index measurements

Jevtic, M.M.; Stanimirovic, Z.; Stanimirovic, I.

doi:10.1016/s0026-2714(00)00207-9

Cited by 15 publications

(7 citation statements)

References 21 publications

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“…Results presented in this chapter can be viewed as an experimental verification of correlation between resistance, gauge factor and low-frequency noise parameters (noise index and current noise spectra) and changes with resistor degradation due to the impact of these three types of straining. Furthermore, they can be seen as validation of earlier presumptions [24,25] that standard resistance, noise spectrum and noise index measurements are valuable tools in reliability evaluation of thick resistive films.…”

Section: Resultsmentioning

confidence: 75%

Low‐Frequency Noise and Resistance as Reliability Indicators of Mechanically and Electrically Strained Thick‐Film Resistors

Stanimirovic¹

2017

System Reliability

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New contemporary applications of thick resistive films are inducing the need to investigate their behaviour under various stressing conditions. On the other hand, there is a growing interest in noise measurements as means of thick-film resistor quality and reliability evaluation and evaluation of degradation under stress. For these reasons, this chapter presents effects of mechanical, electrical and simultaneous mechanical and electrical straining on performances of conventional thick-film resistors that are analysed from micro-and macro-structural, charge transport and low-frequency noise aspects.

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Section: Resultsmentioning

confidence: 75%

Low‐Frequency Noise and Resistance as Reliability Indicators of Mechanically and Electrically Strained Thick‐Film Resistors

Stanimirovic¹

2017

System Reliability

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“…Optimum dwelling time of 10 min at optimum firing temperature gave expected resistor properties for all three compositions. Number of conducting chains was in accordance with sheet resistivities of used resistor compositions [9].…”

Section: Resultsmentioning

confidence: 99%

“…As a result of the sintering process a number of conducting chains is being formed and conducting particles in a chain can be in contact or separated by a thin glass barrier. These formations govern the current flow and, therefore, main conducting mechanisms present in the sintered resistive film are metallic conduction and tunnelling through insulating barriers of metal-insulator-metal structures [9].…”

Section: Materials and Experimental Procedures 21 Firing Of Thick Res...mentioning

confidence: 99%

Firing variables and strain sensitivity of Bi2Ru2O7 thick resistive films

Stanimirovic

2022

SCI SINTER

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In order to provide accurate and semi-real-time information about performances and conditions of various civil engineering structures thick-film resistors are often being used as strain sensors. For that purpose, Ba2Ru2O7 thick resistive films based on compositions with sheet resistivities of 1 kOhm/sq, 10 kOhm/sq and 100 kOhm/sq were evaluated. Resistors were fired at three different peak temperatures (825oC, 850oC and 875oC) and with three different dwelling times (5 min, 10 min and 15 min) in order to correlate influence of firing variables and thick resistive film strain sensitivity by tracking structure-related changes in resistance, gage factor and noise index values. For 10 kOhm/sq composition values of resistance change vs. temperature and temperature coefficient of resistance were measured and calculated.

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“…Since it is noted that contacts between neighbouring conducting particles negligibly affect lowfrequency noise, such behaviour can be attributed to differing spatial distributions of traps in resistors based on compositions with different sheet resistances. Along with measurements of noise voltage spectrum, noise index [15] measurements were performed since noise index is well known as one of the standard quality and reliability indicators used in the fabrication of thick resistive films. Noise index was measured before and after performed stressing.…”

Section: Failure Analysis and Prevention 72mentioning

confidence: 99%

Thick‐Film Resistor Failure Analysis Based on Low‐Frequency Noise Measurements

Stanimirovic¹

2017

Failure Analysis and Prevention

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The chapter aims to present research results in the field of thick-film resistor failure analysis based on standard resistance and low-frequency noise measurements. Noise spectroscopy-based analysis establishes correlation between noise parameters and parameters of noise sources in these heterogeneous nanostructures. Validity of the presented model is verified experimentally for resistors operating under extreme working conditions. For the experimental purposes, thick-film resistors of different sheet resistances and geometries, realized using commercially available thick-film resistor compositions, were subjected to high-voltage pulse (HVP) stressing. The obtained experimental results are qualitatively analysed from microstructure, charge transport mechanism and low-frequency noise aspects. Correlation between resistance and lowfrequency noise changes with resistor degradation and failure due to high-voltage pulse stressing is observed.

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Evaluation of thick-film resistor structural parameters based on noise index measurements

Cited by 15 publications

References 21 publications

Low‐Frequency Noise and Resistance as Reliability Indicators of Mechanically and Electrically Strained Thick‐Film Resistors

Low‐Frequency Noise and Resistance as Reliability Indicators of Mechanically and Electrically Strained Thick‐Film Resistors

Firing variables and strain sensitivity of Bi2Ru2O7 thick resistive films

Thick‐Film Resistor Failure Analysis Based on Low‐Frequency Noise Measurements

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