2011
DOI: 10.1021/cg200749w
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Evidence for Dislocation Induced Spontaneous Formation of GaN Nanowalls and Nanocolumns on Bare C-Plane Sapphire

Abstract: We demonstrate spontaneous growth of a high density of self-organized, oriented, and epitaxial GaN low-dimensional nanostructures on Al 2 O 3 (0001) by sheer kinetic control without involving lithography, catalysts, buffer layers, or any surface pretreatment and consequently reducing process steps. GaN thin films grown by plasma assisted-molecular beam epitaxy (PA-MBE) form wurtzite GaN as a nanowall hexagonal network of flat 2-D films. In a narrow parametric window, 1-D nanocolumns of high density (1 Â 10 8 c… Show more

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Cited by 46 publications
(47 citation statements)
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“…[18][19][20][21][22] The N to Ga ratio also determines the width of the nanowalls as reported previously.…”
Section: Structural Properties Of Lmbe Grown Homoepitaxial Gan Nanostsupporting
confidence: 56%
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“…[18][19][20][21][22] The N to Ga ratio also determines the width of the nanowalls as reported previously.…”
Section: Structural Properties Of Lmbe Grown Homoepitaxial Gan Nanostsupporting
confidence: 56%
“…Recently, a few research groups have reported the growth of GaN nanowall networks on sapphire 18,21 and Si(111) 19,20 using plasma assisted molecular beam epitaxy (PA-MBE). Most of the GaN nanowall networks have been grown heteroepitaxially on these substrates under extremely high N to Ga ux ratio conditions.…”
Section: 18-22mentioning
confidence: 99%
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