2023
DOI: 10.1016/j.carbon.2023.03.061
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Evolution of chemical and mechanical properties in two-photon polymerized materials during pyrolysis

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Cited by 6 publications
(3 citation statements)
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“…1h), such as propylene glycol methyl ether acetate (PGMEA), which is often followed by secondary cleaning steps with solvents such as isopropyl alcohol (IPA). 42–44 Such development processes are needed to ensure that any residual (uncured) photomaterial has been removed. 45–47 Ultimately, these DLW fabrication processes culminate in the production of 3D micro/nanostructured entities comprising cured photomaterial (Fig.…”
Section: Introductionmentioning
confidence: 99%
“…1h), such as propylene glycol methyl ether acetate (PGMEA), which is often followed by secondary cleaning steps with solvents such as isopropyl alcohol (IPA). 42–44 Such development processes are needed to ensure that any residual (uncured) photomaterial has been removed. 45–47 Ultimately, these DLW fabrication processes culminate in the production of 3D micro/nanostructured entities comprising cured photomaterial (Fig.…”
Section: Introductionmentioning
confidence: 99%
“…During annealing at a high temperature, pyrolysis occurs which carbonizes the structure and shrinks it. [37] Shrinkage occurs during annealing and carbonization, which reduces final structure size by 30 % to 50 %. [29,30] Thus, one advantage of this technique is that the final structure is smaller than the printer resolution.…”
Section: Resultsmentioning
confidence: 99%
“…A customized structure is printed in the photoresist by using the laser to trigger chemical cross‐linking of the photoresist polymer, and then developing it to rinse away non‐cross‐linked photoresist. During annealing at a high temperature, pyrolysis occurs which carbonizes the structure and shrinks it [37] . Shrinkage occurs during annealing and carbonization, which reduces final structure size by 30 % to 50 % [29,30] .…”
Section: Resultsmentioning
confidence: 99%