Evolution of composition, microstructure and optical properties of yttrium oxide thin films with substrate temperature

Comparison of Y2O3:Bi3+ phosphor thin films fabricated by the spin coating and radio frequency magnetron techniques

“…Y 2 O 3 recently received significant attention by the scientific and research community mainly due to the excellent physical and chemical properties [1,2]. These properties lead to potential applications of Y 2 O 3 based materials in various scientific and technological fields [1,2].…”

“…These properties lead to potential applications of Y 2 O 3 based materials in various scientific and technological fields [1,2]. Luminescence observed from thin films plays an important role in the development of different luminescent thin film devices such as solar cells, flat-panel displays, light source and integrated optics systems [3].…”

“…Luminescence observed from thin films plays an important role in the development of different luminescent thin film devices such as solar cells, flat-panel displays, light source and integrated optics systems [3]. Thin films based on Y 2 O 3 materials possesses excellent optical properties, such as transparency over a broad spectral range (from visible (VIS) to long-wavelength infrared (LWIR)), high refractive index ( $2.0), large band gap ( $ 5.6 eV) and low absorption [2]. Considerable research has also been conducted on the growth of Y 2 O 3 films for various applications as optical coatings, phosphor thin films and dielectric layers for electroluminescent devices [4].…”

Solution-processed yttrium oxide dielectric for high-performance IZO thin-film transistors

“…Y 2 O 3 has been regarded as one of the most promising candidates for the dielectric for AOS TFTs devices as a consequence of its particular physical properties, such as thermally and chemically stable, low leakage current, high refractive index (~2), wide band gap (5.5eV), relatively high dielectric constant (14~18), and relatively high band offsets (2.3eV) with respect to silicon [12,13]. Several techniques have been employed to fabricate the Y 2 O 3 thin films, including sputtering [10,[15][16][17][18][19][20][21], solution process [11-12, 14, 18], pulsed laser deposition [13,22], molecular beam epitaxy [23], atomic layer deposition [24], ion beam assisted deposition [25], plasma-enhanced chemical vapor deposition [26], and electron-beam deposition [27]. Among these deposition techniques, solution process may reduce equipment costs, decrease the surface roughness, and increase the uniformity of the thin films [12].…”

Synthesis and photoluminescent properties of Y₂O₃:Eu³⁺ thin films prepared from F127-containing solution

“…9) Therefore, these devices require preparing films directly on a glass or an organic substrate. 10) Several methods have been used to prepare Y 2 O 3 :Eu 3+ films such as: magnetron sputtering, 11), 12) vacuum nano-imprint, 13) microwave electron cyclotron resonance plasma, 14) sputtering, 15) excimer-laser-assisted metal organic deposition, 16) chemical bath deposition, 17) CVD, 18), 19) electrodeposition 20), 21) or pulsed laser deposition. 22), 23) However, these techniques usually require expensive and complicated equipment setup.…”