Evolution of Crystallinity and Texturing on 120 MeV Au Ion Irradiation on NiO Thin Films

Mallick, P.; Rath, Chandana; Agarwal, D. C.; Biswal, R.; Behera, D.; Avasthi, D. K.; Kanjilal, D.; Satyam, P.V.; Mishra, N. C.

doi:10.1063/1.3027168

Cited by 5 publications

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“…On the contrary we observe grain growth and texturing in NiO thin films subjected to 120 MeV Au irradiation. In a few cases irradiation has been shown to result in improvement in crystallization [3,[6][7][8][9][10]. This is particularly true for thin solid films, which are not in thermodynamic equilibrium.…”

Section: Resultsmentioning

confidence: 99%

“…100 nm thick NiO thin films were deposited on Si (100) substrates by e-beam evaporation technique from a target made out of NiO in pressed pellet form as described elsewhere [3]. The as-deposited films were sintered at 500 0 C and 700 0 C for half an hour.…”

Section: Methodsmentioning

confidence: 99%

“…Evolution of XRD pattern with 120 MeV Au ion irradiation fluence for NiO thin films on Si(100) substrates sintered at (a) 500 0 C and (b) 700 0 C. The incident X-ray intensity is same in all cases[3].…”

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Observation of grain growth in swift heavy ion irradiated NiO thin films

et al. 2010

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NiO thin films grown on Si(100) substrates by electron beam evaporation, were sintered at 500 0 C and 700 0 C. The films were irradiated with 120 MeV Au 9+ ions. Irradiation had different effects depending upon the initial microstructure of the films. Irradiation of the films at a fluence of 3 × 10 11 ions cm -2 leads to grain growth for the films sintered at 500 0 C and grain fragmentation for the films sintered at 700 0 C. At still higher fluences of irradiation, grain size in 500 0 C sintered film decreased, but the same improved in 700 0 C sintered film. Associated with the grain size, texturing of the films was also shown to undergo significant modifications under irradiation.

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confidence: 99%

Section: Methodsmentioning

confidence: 99%

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Observation of grain growth in swift heavy ion irradiated NiO thin films

et al. 2010

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“…200 nm thick NiO thin films were deposited on Si substrates by ebeam evaporation technique from a target made out of NiO in pressed pellet form as described elsewhere [8]. The films were deposited at ambient substrate temperature and the film deposition NiO nanoparticle thin films grown on Si substrates were irradiated by 107 MeV Ag 8+ ions.…”

Section: Methodsmentioning

confidence: 99%

“…When the dimension of a material is reduced to nanoscale, the response of material to SHI irradiation can be very different from that of the bulk. Thus literature abounds with such conflicting reports as enhanced irradiation resistance of nanoparticles [5], fragmentation and evaporation of nanoparticles [6] and even growth of nanoparticles under SHI irradiation [7,8].…”

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confidence: 97%