2014
DOI: 10.1364/oe.22.023086
|View full text |Cite
|
Sign up to set email alerts
|

Evolution of dielectric function of Al-doped ZnO thin films with thermal annealing: effect of band gap expansion and free-electron absorption

Abstract: Evolution of dielectric function of Al-doped ZnO (AZO) thin films with annealing temperature is observed. It is shown that the evolution is due to the changes in both the band gap and the free-electron absorption as a result of the change of free-electron concentration of the AZO thin films. The change of the electron concentration could be attributed to the activation of Al dopant and the creation/annihilation of the donor-like defects like oxygen vacancy in the thin films caused by annealing.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

0
8
0

Year Published

2016
2016
2022
2022

Publication Types

Select...
8
1

Relationship

0
9

Authors

Journals

citations
Cited by 23 publications
(8 citation statements)
references
References 24 publications
0
8
0
Order By: Relevance
“…In order to improve its electrical properties and reduce sheet resistance and resistivity, while also maintaining a lowcost, nontoxic and stable material, ZnO can be doped with trivalent elec tron donor metals such as Al or Ga to ensure high freecarrier mobility and transparency via the Burnstein-Moss shift that gives metal oxides their useful attributes [25]. Modulating the carrier concentration of a material will also affect its optical properties, specifically the plasma frequency, dielectric con stant or refractive index [26]. Introducing a dopant such as Al into the crystal lattice can also produce tensile stress in the crystal lattice.…”
Section: Lettermentioning
confidence: 99%
“…In order to improve its electrical properties and reduce sheet resistance and resistivity, while also maintaining a lowcost, nontoxic and stable material, ZnO can be doped with trivalent elec tron donor metals such as Al or Ga to ensure high freecarrier mobility and transparency via the Burnstein-Moss shift that gives metal oxides their useful attributes [25]. Modulating the carrier concentration of a material will also affect its optical properties, specifically the plasma frequency, dielectric con stant or refractive index [26]. Introducing a dopant such as Al into the crystal lattice can also produce tensile stress in the crystal lattice.…”
Section: Lettermentioning
confidence: 99%
“…29,30 In addition, the indium-free, cost-effective aluminum zinc oxide (AZO) anode has been proved to be an alternative electrode in MAPbBr 3 devices. AZO is an n-type semiconductor 31 with high electrical conductivity. 32,33 The adhesion between a magnetron-sputtered AZO film and the MAPbBr 3 PSC is relatively high, which is easy to standardize and scale up in comparison to C 60 , or BCP.…”
Section: ■ Introductionmentioning
confidence: 99%
“…The obvious crystal peak is (100) in the sample with 450 cycles, which represents the hexagonal wurtzite phase of polycrystalline ZnO [ 30 , 31 ]. Thermal annealing does have an effect on the crystalline property, and this has been discussed elsewhere [ 7 , 9 , 10 , 22 , 32 ]. The thickness-dependent crystallinity can be used to explain the SE results.…”
Section: Resultsmentioning
confidence: 99%
“…Compared with noble metals, heavily doped semiconductors, such as aluminum-doped zinc oxide (AZO) [ 7 ] and titanium nitride (TiN) [ 8 ], have recently played a more important part in plasmonics and metamaterial applications because of their tunable free carrier concentrations. The doping density [ 8 ], growth atmosphere, and the growth or annealing temperature [ 9 ] were the usual methods to adjust the properties of heavily doped semiconductors. As a heavily doped semiconductor with broad band gap, AZO is a tunable, low-loss plasmonic material capable of supporting high dopant concentrations, and it plays an important role in plasmonic structures [ 10 ].…”
Section: Introductionmentioning
confidence: 99%