2014
DOI: 10.1016/j.matlet.2014.07.012
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Evolution of element distribution at the interface of FTO/SiO x C y films with X-ray photoelectron spectroscopy

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Cited by 17 publications
(19 citation statements)
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“…Moreover, the chemical states distribution in the XPS spectra was changed from the as‐prepared FTO films to those annealed, mainly referring to the Sn3d 5/2 and Si2p, which were influenced by oxygen‐deficient states and lattice mismatch in the diffusion layer caused by thermal treatment. As expected, the electrical properties were affected and, comparing the as‐prepared and annealed FTO film at 262 s, the charge density decreased from 6.98 × 10 20 to 1.39 × 10 20 cm −3 and the resistivity increased from 3.13 × 10 −4 to 4.73 × 10 −4 Ω cm 49 …”
Section: Temperature Effects On Tco Substratesupporting
confidence: 66%
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“…Moreover, the chemical states distribution in the XPS spectra was changed from the as‐prepared FTO films to those annealed, mainly referring to the Sn3d 5/2 and Si2p, which were influenced by oxygen‐deficient states and lattice mismatch in the diffusion layer caused by thermal treatment. As expected, the electrical properties were affected and, comparing the as‐prepared and annealed FTO film at 262 s, the charge density decreased from 6.98 × 10 20 to 1.39 × 10 20 cm −3 and the resistivity increased from 3.13 × 10 −4 to 4.73 × 10 −4 Ω cm 49 …”
Section: Temperature Effects On Tco Substratesupporting
confidence: 66%
“…The commonly employed methods to obtain FTO substrates involve chemical reactions on glass substrate, which can be heated and/or subjected to an additional thermal treatment step to produce fluorine‐doped tin oxide. Chemical precursors like SnCl 4 , SnCl 2 , C 4 H 9 SnC 13 and NH 4 F, CF 3 COOH have been used as tin and fluoride source in chemical spray pyrolysis, ultrasonic spray pyrolysis, atmosphere pressure chemical vapor deposition, electrochemical deposition at atmospheric pressure, not exclusively 44,46–49 . Considering that the precursors can be prepared in aqueous, acid, organic solutions and a mixture of them, hydrogen interaction is facilitated on the hydrophilic surface of silicate‐based glass substrates, on which O − ions, [glass](OH) − , acts as nucleation sites for heterogeneous surface reactions.…”
Section: Temperature Effects On Tco Substratementioning
confidence: 99%
“…In the past few years, the dual-wavelength laser is a hot international research topic [1][2][3][4][5] . Since its structure is compact and can be miniaturized, the solid-state dual-wavelength laser is able to supply more output power, and can cover wider bands [6,7] . Over the past decade, there has been considerable interest in developing dual-wavelength lasers, especially Nd-doped dual-wavelength lasers [8][9][10][11] .…”
mentioning
confidence: 99%
“…Since the microstructure of FTO films prepared by CVD is formed quickly, many defects or dangling bonds exist in the films. According to the previous work 17 18 , oxygen exists in three chemical states on the film surface: absorbed oxygen O abs and lattice oxygen of two different types O I and O II . Accordingly, if a large amount of oxygen is absorbed on the film surface, it would increase the [O]/[Sn] ratio at the surface layer, as reported previously 17 19 .…”
Section: Resultsmentioning
confidence: 99%