“…The commonly employed methods to obtain FTO substrates involve chemical reactions on glass substrate, which can be heated and/or subjected to an additional thermal treatment step to produce fluorine‐doped tin oxide. Chemical precursors like SnCl 4 , SnCl 2 , C 4 H 9 SnC 13 and NH 4 F, CF 3 COOH have been used as tin and fluoride source in chemical spray pyrolysis, ultrasonic spray pyrolysis, atmosphere pressure chemical vapor deposition, electrochemical deposition at atmospheric pressure, not exclusively 44,46–49 . Considering that the precursors can be prepared in aqueous, acid, organic solutions and a mixture of them, hydrogen interaction is facilitated on the hydrophilic surface of silicate‐based glass substrates, on which O − ions, [glass](OH) − , acts as nucleation sites for heterogeneous surface reactions.…”