Evolution of polymorph and photoelectric properties of VO2 thin films with substrate temperature

Effect of Substrate Temperature on the Structural, Optical and Electrical Properties of DC Magnetron Sputtered VO2 Thin Films

“…Finally, we compare our results with other works [ 21 , 28 , 30 , 57 ] in which the effect of T S on the phase transition properties of VO 2 thin films have been studied. These studies have employed RF reactive inverted cylindrical magnetron sputtering [ 21 ], RF magnetron sputtering [ 28 ], inductively coupled plasma (ICP)-assisted sputtering [ 30 ], and pulsed-laser deposition (PLD) [ 57 ] for thin film preparation. We also consider selected works [ 26 , 36 ] which have reported the production of high-quality VO 2 thin films at low substrate temperatures.…”

“…On the contrary, in Figure 14 d, the Δ H values appear to be relatively unaffected by T S , and they seem to be mostly constant around 5.5 K, only films prepared at 450 °C have a large Δ H around 10 K. The T t values obtained from Ref. [ 57 ] are constant around 343 K. In addition, the Δ H drops with decreasing T S from 13 K and 5 K. However, if the phase transition sharpness and Δ σ are taken into consideration, these films in Refs. [ 28 , 57 ] do not display attributes associated with high-quality films with decreasing T S .…”

“…The drop in Δ σ and the apparent narrowing of Δ E may too be related to the increased density of grain boundaries and defects of oxygen vacancies due to low T S which is pointed out in Ref. [ 57 ]. In addition, Figure 13 presents the shifting of the amplified XRD peak of VO 2 (011) at ~28° to a lower angle as T S decreases.…”

“…Figure 14 c,d present the comparison of electrical phase transition properties obtained from Refs. [ 28 , 57 ]. Moreover, VO 2 films reported in Ref.…”

“…[ 57 ] are constant around 343 K. In addition, the Δ H drops with decreasing T S from 13 K and 5 K. However, if the phase transition sharpness and Δ σ are taken into consideration, these films in Refs. [ 28 , 57 ] do not display attributes associated with high-quality films with decreasing T S . Overall, according to these comparisons, the preparation of high-quality VO 2 films at low temperatures appear to be a challenge even though different deposition techniques and deposition parameters are applied.…”