2020
DOI: 10.1016/j.apsusc.2020.145464
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Evolution of surface oxides and impurities in high vacuum heat treated Nb: A TEM and TOF-SIMS in-situ study, mechanism and repercussions on SRF cavity applications

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Cited by 9 publications
(9 citation statements)
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“…In Figure b, we observe that the signal associated with Nb 2 O 5 exhibits a peak closer to the surface whereas the NbO 2 and NbO signals persist further into the film. This is in agreement with the literature indicating a change in valence state for the Nb throughout the oxide. , As the presence of Nb 2 O 5 has been specifically linked to decoherence in Nb superconducting qubit systems, we focus our analysis to this region throughout the text.…”
Section: Resultssupporting
confidence: 87%
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“…In Figure b, we observe that the signal associated with Nb 2 O 5 exhibits a peak closer to the surface whereas the NbO 2 and NbO signals persist further into the film. This is in agreement with the literature indicating a change in valence state for the Nb throughout the oxide. , As the presence of Nb 2 O 5 has been specifically linked to decoherence in Nb superconducting qubit systems, we focus our analysis to this region throughout the text.…”
Section: Resultssupporting
confidence: 87%
“…Although direct quantification of these oxides can be challenging due to the possibility for molecular fragmentation prior to detection by the analyzer, monitoring these signals provides qualitative information regarding their spatial location within the oxide layer. 21 In Figure 1b, we observe that the signal associated with Nb 2 O 5 exhibits a peak closer to the surface whereas the NbO 2 and NbO signals persist further into the film. This is in agreement with the literature indicating a change in valence state for the Nb throughout the oxide.…”
Section: Resultsmentioning
confidence: 87%
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“…The relative in-plane uniformity present in these profiles confirms that depth profiles are taken from representative regions free of surface features and the arti-facts that they can introduce. [41,42] Furthermore, it is again apparent that the lithography process introduces increased oxygen and hydrocarbon species throughout the film.…”
Section: Methodsmentioning
confidence: 99%
“…Even though diffusion of the nitrogen into the bulk of the SRF cavity is limited in depth at these low temperatures (120-200 °C), the introduction of nitrogen is sufficient to modify the cavity surface within the rf penetration depth as seen from cavities' test results, which are similar to those previously reported for high-temperature nitrogen doped cavities. The nitridation and diffusion of nitrogen in to the bulk is expected when the Nb surface is free of Nb2O5 which occurs >300 C [84,85], but the infusion was done when the cavity was fully annealed at 800 C/3hrs and cooldown to desired temperature under UHV conditions before injecting nitrogen in to the furnace. While post-doping electropolishing is required to remove coarse nitrides from the surfaces of high-temperature nitrogen doped cavities, no further processing is required for the low-temperature "infusion" recipe showing a clear benefit in reducing processing steps as well as keeping higher gradient with high Q0 values.…”
Section: B Recipe Development At Low Temperaturementioning
confidence: 99%