Thermophoretic effect on particle deposition velocity onto an inverted flat surface was numerically investigated, by employing the Statistical Lagrangian Particle Tracking (SLPT) model. The SLPT model was verified to be correct, when the numerically obtained particle deposition velocities were compared with the theoretically predicted particle deposition velocities, with and without considering thermophoresis. Temperature difference between flat surface and ambient air, particle density, and airflow velocity were found to affect the particle deposition velocity onto the inverted flat surface under the influence of thermophoresis. Thermal conductivity ratio between air and particle, however, was found to be insignificant in affecting the particle deposition velocity onto the inverted flat surface. Particulate contamination of the inverted critical surface was estimated to be greatly reduced by heating the surface. On the other hand, the face-down critical surface was anticipated to be contaminated by particles when the surface temperature was lower than the ambient temperature, even with the scheme of inverted orientation.The control of particulate contamination in semiconductor manufacturing becomes more important with decreasing feature size. According to the International Technology Roadmap for Semiconductors (ITRS 2010), the feature size is expected to shrink down to 27 nm by 2014, which implies that even nanoparticles need to be considered as the possible contamination sources. In addition, photomasks used for the Extreme Ultraviolet Lithography (EUVL), which is thought of as the prominent candidate for the next lithography technology generation to manufacture the patterns of 32 nm or smaller, cannot be protected by pellicles against particulate contamination. 1,2Mounting wafers or photomasks with their critical surfaces facing-down is one of the schemes to reduce the level of particulate contamination, since particles can drift away from the critical surface due to the gravitational settling. 3-6 External forces other than the gravity, for instance electrophoresis or thermophoresis, can be applied to repel the particles away from the face-down critical surface. The electrophoresis, however, may be counterproductive depending on the polarity of particles. 3,5 On the other hand, thermophoresis, which is the phenomenon wherein aerosol particles drift in the direction of decreasing temperature, forces particles to move in one direction and therefore can be useful for pushing the particles away from the critical surface, if an appropriate temperature gradient is established.Particle deposition velocity is defined as the ratio of the particle flux onto a surface to the number concentration of aerosol particles above that surface, and thus can be used to assess the possibility of the critical surface to be contaminated by particles. Many studies have been performed to investigate the particle deposition velocity onto free standing face-up wafers situated perpendicular to the airflow, by assuming the vertical airflo...