2019 IEEE Radio Frequency Integrated Circuits Symposium (RFIC) 2019
DOI: 10.1109/rfic.2019.8701760
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Excellent 22FDX Hot-Carrier Reliability for PA Applications

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Cited by 29 publications
(3 citation statements)
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“…The simulated maximum gate-source voltage during the ramp-up of 5V supply is <420mV which is lower than 0.88V. The corresponding maximum gate-drain (<850mV) and drain-source voltages(<820mV) during this simulation are also well below the maximum limit (2.4V) at which they can be used [36]. Because of the isolation between the D/S and back-gate terminals of the transistors in the FDSOI technology, there is no risks of the forward-bias diode formation like that in a bulk process.…”
Section: Biasingmentioning
confidence: 81%
“…The simulated maximum gate-source voltage during the ramp-up of 5V supply is <420mV which is lower than 0.88V. The corresponding maximum gate-drain (<850mV) and drain-source voltages(<820mV) during this simulation are also well below the maximum limit (2.4V) at which they can be used [36]. Because of the isolation between the D/S and back-gate terminals of the transistors in the FDSOI technology, there is no risks of the forward-bias diode formation like that in a bulk process.…”
Section: Biasingmentioning
confidence: 81%
“…In addition, the size was large partly due to the PAE enhancing stack resonators. A differential 3-stack with 22 nm CMOS SOI [13] provides very good output power with a comparable PAE but smaller gain, whereas a differential 2-stack using a 22 nm CMOS SOI [23] shows a very good efficiency, gain and 1 dB compression point, but due to the low VDD, the output power is not comparable to 3 or 4-stack PAs. A differential 2-stack [24,25] implemented using a 28 nm bulk CMOS also shows very high efficiency with a comparable gain and linearity but smaller output power and larger size.…”
Section: Comparison Of the Measured Resultsmentioning
confidence: 99%
“…The simulated maximum gate-source voltage during the ramp-up of 5V supply is <420mV which is lower than 0.88V. The corresponding maximum gate-drain (<850mV) and drain-source voltages(<820mV) during this simulation are also well below the maximum limit (2.4V) at which they can be used [149]. Because of the isolation between the D/S and back-gate terminals of the transistors in the FDSOI technology, there is no risks of the forward-bias diode formation like that in a bulk process.…”
Section: Biasingmentioning
confidence: 81%