2001
DOI: 10.1016/s1387-3806(00)00377-8
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Excimer formation in high-pressure microhollow cathode discharge plasmas in helium initiated by low-energy electron collisions

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Cited by 87 publications
(68 citation statements)
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“…This fluorescence of He2 * at 60.2 nm is named 'first continuum'. A 'second continuum' is also present between 60 and 100 nm but it could not be observed in our experimental conditions due to its low emissivity [44]. Figure 9(b) represents the evolution of the first continuum intensity versus the O2 flow rate in the post-discharge.…”
Section: Note: This Document Is a Pre-print Version You May Use It Amentioning
confidence: 88%
See 1 more Smart Citation
“…This fluorescence of He2 * at 60.2 nm is named 'first continuum'. A 'second continuum' is also present between 60 and 100 nm but it could not be observed in our experimental conditions due to its low emissivity [44]. Figure 9(b) represents the evolution of the first continuum intensity versus the O2 flow rate in the post-discharge.…”
Section: Note: This Document Is a Pre-print Version You May Use It Amentioning
confidence: 88%
“…the excitation of an already excited atomic/molecular state) and by 3-body collisions leading to the formation of excimers [43][44][45]. The assumption of helium excimers produced in the discharge (i.e.…”
Section: Note: This Document Is a Pre-print Version You May Use It Amentioning
confidence: 99%
“…In either case, the initial step is a three-body collision process in which two ground state atoms interact with an excited state atom (metastable state or resonance, Table 5). Efficient excimer formation requires both a sufficiently large number of electrons with energies above the threshold for the metastable formation (or ionization), and a pressure that is high enough to have a sufficiently high rate of three-body collisions (Kurunczi et al, 2001). In case of Ar, the minimum energy needed to form a metastable Ar atom by electron impact on ground-state Ar is about 12 eV.…”
Section: Photonsmentioning
confidence: 99%
“…Microplasmas ecompase the adventages of low-pressure plasmas with the advenatges of being micro [1][2][3][4]. Due to their portability and the non-equilibrium character of the discharges, microplasmas are finding application in many research disciplines, from the optimizing the plasma screens [5], localized silicon etching [6], tunable UV source [7], gas spectroscopy [8,9], spectroscopy of water impurities [10], up to localized treatment of materials and assembly of nanostructures [11]. On the other hand, plasma-based microsystems can find application in bio microelectromechanical system (bio-MEMS) sterilization, small-scale materials processing and microchemical analysis systems [12].…”
Section: Introductionmentioning
confidence: 99%