2007
DOI: 10.1007/s11664-007-0105-9
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Excimer Laser Etching Process of CdTe Crystals for Formation of Deep Vertical Trenches

Abstract: Deep isolation trenches with high aspect ratio were formed on CdTe crystals using the excimer laser etching technique. Vertical trenches 80-lm deep and 55-lm wide were formed in 5 min by irradiating a laser on the CdTe crystal through a contact-type metal mask in vacuum. Surface chemistry of the laserirradiated CdTe crystal was examined by Auger electron spectroscopy (AES), scanning electron microscopy (SEM), and photoluminescence (PL) to determine the extent of laser-induced damage. It was found that the dama… Show more

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“…Laser irradiation of CdTe has been used for different kinds of surface processing, including cleaning, etching, oxide film removal, stress relieving, local annealing, epitaxial recrystallization, nanostructure formation, formation of homo and hetero-interfaces, etc. [4][5][6][7]. However, any surface treatment is accompanied by changes of morphology and surface state, transformation of structure, formation of regions with residual internal stresses, etc.…”
Section: Introductionmentioning
confidence: 99%
“…Laser irradiation of CdTe has been used for different kinds of surface processing, including cleaning, etching, oxide film removal, stress relieving, local annealing, epitaxial recrystallization, nanostructure formation, formation of homo and hetero-interfaces, etc. [4][5][6][7]. However, any surface treatment is accompanied by changes of morphology and surface state, transformation of structure, formation of regions with residual internal stresses, etc.…”
Section: Introductionmentioning
confidence: 99%