2017
DOI: 10.1117/12.2257972
|View full text |Cite
|
Sign up to set email alerts
|

Excimer laser gas usage reduction technology for semiconductor manufacturing

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1

Citation Types

0
2
0

Year Published

2021
2021
2024
2024

Publication Types

Select...
2
1

Relationship

0
3

Authors

Journals

citations
Cited by 3 publications
(2 citation statements)
references
References 1 publication
0
2
0
Order By: Relevance
“…Various methods have been used to fabricate the microfluidic chips, including photolithography, soft lithography, laser etching, hot embossing, and machining process. As a well-developed technique, photolithography enables the micro/nano structures with a high resolution[ 16 ]. The extreme ultraviolet (EUV) lithography enables the fabrication of microstructures down to 10 nm[ 17 ].…”
Section: The Structures Of Heart-on-a-chipmentioning
confidence: 99%
“…Various methods have been used to fabricate the microfluidic chips, including photolithography, soft lithography, laser etching, hot embossing, and machining process. As a well-developed technique, photolithography enables the micro/nano structures with a high resolution[ 16 ]. The extreme ultraviolet (EUV) lithography enables the fabrication of microstructures down to 10 nm[ 17 ].…”
Section: The Structures Of Heart-on-a-chipmentioning
confidence: 99%
“…From the different commercially available laser configurations, excimer lasers are the most used NLA technologies in the silicon industry 88 , with increasing importance as light sources for photolithography processes 89 . They rely on the relaxation process of previously excited groups of atoms called excited dimers (hence the excimer denomination) to produce monochromatic coherent light beams, which are focused at the output to increase the effective laser energy density (commonly referred to "laser fluence").…”
Section: Nanosecond Laser Annealing Processmentioning
confidence: 99%